2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (IEEE Cat. No.04CH37530)
DOI: 10.1109/asmc.2004.1309598
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Application of advanced macro defect inspection technology for MEMS processes

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“…The automatic inspection implemented by systems such as NSX tool, is based on training of the gray level for each pixel on about twenty training dice: a mean and standard deviation image, and upper and lower limits are created for the pixels [4]. The escape of the pin hole appeared when the contrast between the background metal and the pin hole was not sufficient (see Fig.…”
Section: Detectionmentioning
confidence: 99%
“…The automatic inspection implemented by systems such as NSX tool, is based on training of the gray level for each pixel on about twenty training dice: a mean and standard deviation image, and upper and lower limits are created for the pixels [4]. The escape of the pin hole appeared when the contrast between the background metal and the pin hole was not sufficient (see Fig.…”
Section: Detectionmentioning
confidence: 99%