2003
DOI: 10.1063/1.1571947
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Apparatus for pulsed laser deposition of semiconductor thin films

Abstract: This article is devoted to description of an apparatus for pulsed laser deposition of thin films of semiconducting compounds. The apparatus is based on a typical vacuum plant for thin films deposition. The most important feature of this setup is an optical deflector that switches the laser beam between three rotating targets situated side by side. The switching program is controlled by a PC. Owing to a short switching time, below 100 ms, the program can consist many switching in a short time. This allows growi… Show more

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Cited by 5 publications
(3 citation statements)
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“…The PLA apparatus used in our experiments is described in detail elsewhere [13]. The apparatus consist of a quadrupole mass spectrometer (QMS, HALO 301, Hiden Analytical) equipped with a pulse ion counter.…”
Section: Experimental Set-upmentioning
confidence: 99%
“…The PLA apparatus used in our experiments is described in detail elsewhere [13]. The apparatus consist of a quadrupole mass spectrometer (QMS, HALO 301, Hiden Analytical) equipped with a pulse ion counter.…”
Section: Experimental Set-upmentioning
confidence: 99%
“…We describe briefly an original and low-cost apparatus for the PLD of II-VI compounds and their mixed crystals. A detailed description of this apparatus is given in [5]. The main novelty of the proposed solution, in comparison with the known solutions [1][2][3][4], is the use of a tripod-based optical switch that switches the laser radiation between three rotating targets in a time shorter than 0.1 s. The operation of the switch is computer controlled, and thereby a variety of layered thin film structures, made of the A 2 -B 6 compounds or their mixtures, can be obtained.…”
Section: Introductionmentioning
confidence: 99%
“…The concave mirror reflects the beam onto a flat mirror of the optical deflector, which directs the beam through an opening in the substrate holder/heater onto a surface of one of the targets. Other details of the apparatus construction less important for the present studies can be found in the source article (Oszwałdowski et al, 2003 ) Quadrupol Mass Spectrometer (QMS) The apparatus is supplied with a quadrupole mass spectrometer (QMS, HALO 301, Hiden Analytical) equipped with a pulse ion counter. The action of the QMS is synchronized with the laser action by a specially designed electronic device.…”
Section: Introductionmentioning
confidence: 99%