2009
DOI: 10.1088/0268-1242/24/6/065011
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Antisymmetric magnetoresistance anomalies and magnetic domain structure in GaMnAs/InGaAs layers

Abstract: Antisymmetric magneto-resistance anomalies generated by a reversal of the magnetization are studied in a number of GaMnAs/InGaAs layers with out-of-plane (easy axis) magnetization. The anomalies occur independent of the magnetic field orientation. This shows, that once a magnetic domain with reversed magnetization is nucleated, simply the presence of the domain wall between the longitudinal contacts is sufficient to give rise to the anomaly. Very different shapes for magneto-resistance anomaly can be observed … Show more

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Cited by 16 publications
(11 citation statements)
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“…Antisymmetric MR is uncommon, but it has been reported to have occurred in two different systems. The first was composed of single-layer magnetic thin films with perpendicular anisotropy (39,40). In a magnetic thin film with perpendicular anisotropy, two single magnetic domains separated by a 180° domain wall are formed.…”
Section: Resultsmentioning
confidence: 99%
“…Antisymmetric MR is uncommon, but it has been reported to have occurred in two different systems. The first was composed of single-layer magnetic thin films with perpendicular anisotropy (39,40). In a magnetic thin film with perpendicular anisotropy, two single magnetic domains separated by a 180° domain wall are formed.…”
Section: Resultsmentioning
confidence: 99%
“…Different mechanisms are proposed to understand the MR effects in magnetic materials, however these effects share the common symmetry with respect to magnetization reversal, namely MR (H) = MR (−H). It is believed that the variation of multi-domain configuration during magnetization reversal process with MR (H) = -MR (−H) anomaly contributes to antisymmetric MR[43][44][45]. However there are mixed reports regarding the experimental conditions required for the observation of antisymmetric MR[43- 45].…”
mentioning
confidence: 99%
“…The Ga 1-x Mn x As layers were growth by a molecular beam epitaxy at 230 ºC on a semi-insulating GaAs(001) substrates using the KRYOVAK MBE system at MAX-Lab, Lund University, Sweden [14,15]. The growth was performed with As 2 flux generated from an arsenic valve cracker source.…”
Section: Methodsmentioning
confidence: 99%