2018
DOI: 10.1016/j.matlet.2018.07.082
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Antibacterial effect of Cu/C:F nanocomposites deposited on PEEK substrates

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Cited by 26 publications
(20 citation statements)
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“…During osseointegration processes, it is very important to inhibit the development of the bacterial microfilm, which can cause inflammations that may be dangerous for patients' health or even be the reason for implant rejection. [35] Among the most effective methods for preventing the development of bacterial microfilm on PEEK coatings is the use of antibacterial agents, such as sulfur, [36][37][38] silver, [29,39] copper, [40] silicon nitride [41] and chitosan. [20,21] Another widely examined aseptic factor is MoS 2 .…”
Section: Introductionmentioning
confidence: 99%
“…During osseointegration processes, it is very important to inhibit the development of the bacterial microfilm, which can cause inflammations that may be dangerous for patients' health or even be the reason for implant rejection. [35] Among the most effective methods for preventing the development of bacterial microfilm on PEEK coatings is the use of antibacterial agents, such as sulfur, [36][37][38] silver, [29,39] copper, [40] silicon nitride [41] and chitosan. [20,21] Another widely examined aseptic factor is MoS 2 .…”
Section: Introductionmentioning
confidence: 99%
“…The superhydrophobic fabric prevents water permeation through its diffusion layer restricting the interaction of Cu NPs with an aqueous medium. Hence much lower ion release is achieved and a smaller number of Cu ions could reach the bacteria …”
Section: Resultsmentioning
confidence: 99%
“…Such a low value of surface roughness highlights the very smooth characteristic of the C:H:N:O film, and since the sputtering process was performed under a relatively high pressure of 3 Pa and low power, it was assumed that such a film would probably copy the surface topography of the underlying diamond foil and not destroy it. The adhesion of the carbon-containing C:H:N:O film to the diamond as a carbon structure can be expected to be high, because of both (i) the possible activation of the nanodiamond surface by the plasma [37], which may lead to the creation of covalent bonds between the nanodiamond and the C:H:N:O film, and (ii) the relatively high surface energy of the C:H:N:O material, i.e., 46 mJ/m 2 , composed of a polar part of 24 mJ/m 2 and a dispersive part of 21 mJ/m 2 , as measured in our previous study [36], which can lead to electrostatic and dispersive interaction between both materials. Another important parameter is the stability of C:H:N:O in water-based environments.…”
Section: Topography Of Nylon and Stability In Watermentioning
confidence: 99%
“…Polymers from PTFE [34], polyethylene [35], and nylon [36] targets have already been prepared by this method in previous studies. Plasma polymers usually copy the topography of the underlying surface; therefore, the material is ideal for nanostructure stabilization, as was shown with nanoparticles [37]. Plasma polymers can be further tailored by changing the deposition conditions with regards to the water stability, the presence of functional groups, and surface energy.…”
mentioning
confidence: 99%