2020
DOI: 10.1016/j.optmat.2020.110027
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Anti-reflection and self-cleaning meso-porous TiO2 coatings as solar systems protective layer: Investigation of effect of porosity and roughness

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Cited by 27 publications
(11 citation statements)
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“…Nevertheless, coating a perovskite layer with a higher MoO x concentration is expected to lower the absorption of the sample due to the possibility of light scattering in the MoO x layer, where optical reflection losses occur. It has been reported that the reflective index of the MoO x film was in the range of 2.00–2.25 at a solar radiation wavelength of 750 nm depending on the preparation conditions. , However, reflective indices of 2.5 for MAPbI 3 and 2.1 for MAPbBr 3 were reported. , It is worth mentioning that the minimal reflection loss is obtained when the optical index of the coating layer is equal to the square root of the surrounding medium’s reflective index multiplied by the index of reflection of the substrate being used. , The optical band gap of amorphous MoO x was found to lie in a range of 3.0–3.5 eV and greatly depended on the preparation conditions. , Cauduro et al reported a band gap of 3.06 eV for substoichiometric MoO 2.57 films. On the other hand, the optical band gap is 3.29 eV when a stoichiometric MoO 3 layer is deposited…”
Section: Results and Discussionmentioning
confidence: 99%
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“…Nevertheless, coating a perovskite layer with a higher MoO x concentration is expected to lower the absorption of the sample due to the possibility of light scattering in the MoO x layer, where optical reflection losses occur. It has been reported that the reflective index of the MoO x film was in the range of 2.00–2.25 at a solar radiation wavelength of 750 nm depending on the preparation conditions. , However, reflective indices of 2.5 for MAPbI 3 and 2.1 for MAPbBr 3 were reported. , It is worth mentioning that the minimal reflection loss is obtained when the optical index of the coating layer is equal to the square root of the surrounding medium’s reflective index multiplied by the index of reflection of the substrate being used. , The optical band gap of amorphous MoO x was found to lie in a range of 3.0–3.5 eV and greatly depended on the preparation conditions. , Cauduro et al reported a band gap of 3.06 eV for substoichiometric MoO 2.57 films. On the other hand, the optical band gap is 3.29 eV when a stoichiometric MoO 3 layer is deposited…”
Section: Results and Discussionmentioning
confidence: 99%
“…32,33 It is worth mentioning that the minimal reflection loss is obtained when the optical index of the coating layer is equal to the square root of the surrounding medium's reflective index multiplied by the index of reflection of the substrate being used. 34,35 The optical band gap of amorphous MoO x was found to lie in a range of 3.0−3.5 eV and greatly depended on the preparation conditions. 36,37 Cauduro et al reported a band gap of 3.06 eV for substoichiometric MoO 2.57 films.…”
Section: Resultsmentioning
confidence: 99%
“…However, several other physicochemical strategies have been adopted for enhanced performance of TiO 2 ARCs. These include the inclusion of a porogen (pore-forming agent) and chemical acid-etching with 5% HF that increase the porosity and surface roughness, respectively, and reduce reflectivity (Rad et al, 2020).…”
Section: Physicochemical Strategies For Improved Tio 2 Antireflection and Self-cleaning Propertiesmentioning
confidence: 99%
“…The most effective method to eliminate surface reflection is the application of an antireflective coating 3–5 . Numerous studies have shown that the surface modification of the polymer films by organic coating is relatively simple, and the antireflective effect cannot meet the ideal requirements 6 . Organic–inorganic hybrid materials show better performance compare with that.…”
Section: Introductionmentioning
confidence: 99%