2007
DOI: 10.1002/adma.200701246
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Anomalous Optical Properties of InN Nanobelts: Evidence of Surface Band Bending and Photoelastic Effects

Abstract: In the past few years InN, the least understood Group III nitride compound, has attracted a great deal of interest because of its unique properties, making it suitable for applications in various electronic and optoelectronic devices. [1][2][3][4][5][6][7][8] In addition, InN is considered as a potential material for lowcost, low-power-consumption, high-sensitivity detection in gas, vapors, and liquids by virtue of its intrinsic surface charge accumulation. [9][10][11][12] Consequently, the preparation and stu… Show more

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Cited by 14 publications
(9 citation statements)
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“…8,[19][20][21][22][23][24][25][26][27][28][29][30] For example, in general, the currently reported nominally undoped InN is n-type degenerate, with the residual electron densities in the range of ∼ 1 × 10 18 cm −3 , or higher. 8,11,25,[31][32][33][34] Moreover, it has been generally observed that there exists a very high electron concentration (∼ 1 × 10 13−14 cm −2 ) at both the polar and nonpolar grown surfaces of InN films, 19,35 and the Fermi-level (E F ) is pinned deep into the conduction band at the surfaces; 19,20,29,30 similar electron accumulation profile has also been measured at the lateral nonpolar grown surfaces of [0001]-oriented wurtzite InN nanowires. 8,11,21,22,25,36 In this regard, significant efforts have been devoted to understanding the fundamental surface charge properties of InN.…”
mentioning
confidence: 69%
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“…8,[19][20][21][22][23][24][25][26][27][28][29][30] For example, in general, the currently reported nominally undoped InN is n-type degenerate, with the residual electron densities in the range of ∼ 1 × 10 18 cm −3 , or higher. 8,11,25,[31][32][33][34] Moreover, it has been generally observed that there exists a very high electron concentration (∼ 1 × 10 13−14 cm −2 ) at both the polar and nonpolar grown surfaces of InN films, 19,35 and the Fermi-level (E F ) is pinned deep into the conduction band at the surfaces; 19,20,29,30 similar electron accumulation profile has also been measured at the lateral nonpolar grown surfaces of [0001]-oriented wurtzite InN nanowires. 8,11,21,22,25,36 In this regard, significant efforts have been devoted to understanding the fundamental surface charge properties of InN.…”
mentioning
confidence: 69%
“…In terms of nonpolar InN surface, recent studies suggest that the surface electron accumulation may depend critically on the surface states, impurities, stoichiometry, and polarity; 27,37 and the absence of electron accumulation at nonpolar surface has been predicted. 23,27 In experiments, however, only recent cross-sectional scanning photoelectron microscopy and spectroscopy studies at nonpolar cleaved InN surface exhibits the unpinned E F , 38,39 while in general the electron accumulation is prevalently observed at nonpolar InN surface; 22,34,35 the electron accumulation issue at nonpolar InN surface had remained elusive.…”
mentioning
confidence: 99%
“…Most InN samples reported recently are n-type degenerate semiconductors, with an electron concentration of approximately 1 × 10 18 cm −3 or higher. Much research has been dedicated to understanding the fundamental properties of InN, especially its photoluminescence (PL) properties [8][9][10][11]. The optical properties of semiconductors are very sensitive to the increase in carrier concentration and are reflected in the blueshift of peak energy and the expansion of the peak width.…”
Section: Introductionmentioning
confidence: 99%
“…Most InN samples reported are degenerate n-type materials with an electron concentration of about 1 × 10 18 cm −3 or even higher. In order to understand the fundamental properties of InN, much research has been conducted, especially on the photoluminescent (PL) properties of InN, which has been investigated intensively [8][9][10][11]. In semiconductor materials, the optical properties are extremely sensitive to carrier concentration, i.e., blueshift of peak energy and the broadening of full-with-half-maximum (FWHM) with increasing carrier concentration.…”
Section: Introductionmentioning
confidence: 99%