Anodization of Al–Nd alloy films in nonaqueous electrolyte solutions for TFT-LCD application

Ue, Makoto; Mizutani, Fumikazu; Takaha, Hiroshi; Takeuchi, Sachie; Sugiyama, K.; Nishiwaki, Tetsuo; Sato, Nao

doi:10.1016/s0013-4686(01)00550-3

Cited by 11 publications

(15 citation statements)

References 27 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Difference of j res in the kind of electrolyte solution agreed with previous data. 11 Total electric charge consumed (Q total ) decreased slightly with j f from about 0.18 C cm Ϫ2 at the lowest current density to 0.15 C cm Ϫ2 at the highest. Q total was independent of alloy composition, while it was slightly higher for the samples formed in electrolyte solution with ammonium salicylate.…”

Section: Resultsmentioning

confidence: 91%

“…The independence of Q total on alloy composition and the dependence on the kind of electrolyte solution is similar to previous data. 11 Film characterization.-The cross-sectional TEM images of anodic oxide films are shown in Fig. 2.…”

Section: Resultsmentioning

confidence: 99%

“…Using an aqueous electrolyte solution, which contains organic anions, carbon species also incorporate into the anodic film, but the amount is much smaller. 11 The electrical properties of the anodic oxides were highly affected by the incorporated carbon species, even when the amount of carbon incorporated was relatively low. 10,11 Therefore, it is important to control the amount of carbon incorporated by anodization condition, when an anodic oxide film is used as the overlayer of interconnects.…”

mentioning

confidence: 99%

“…11 The electrical properties of the anodic oxides were highly affected by the incorporated carbon species, even when the amount of carbon incorporated was relatively low. 10,11 Therefore, it is important to control the amount of carbon incorporated by anodization condition, when an anodic oxide film is used as the overlayer of interconnects. In this study, insulating properties of anodic films formed in nonaqueous electrolyte solutions at various forming current densities were examined.…”

mentioning

confidence: 99%

See 3 more Smart Citations

Formation and Electric Properties of Anodic Oxide Films on Al-Nd Sputtered Films in Nonaqueous Electrolyte Solutions

Mizutani

Takeuchi

Takaha

et al. 2001

J. Electrochem. Soc.

View full text Add to dashboard Cite

Sputtered Al-Nd alloy films were anodized in nonaqueous electrolyte solutions at various current densities, on which the amounts of incorporated carbon species into the oxide films depend. The resultant oxide films were characterized by Fourier transform infrared ͑FTIR͒, cross-sectional transmission electron microscopy ͑XTEM͒, and secondary-ion mass spectroscopy ͑SIMS͒. Electrical properties such as relative permittivity and dielectric strength were also measured for these films. The FTIR peak position associated with Al-O stretching vibration was correlated with the relative permittivity and dielectric strength of the anodic oxide film. Since the peak position is dependent on the condition of anodization, FTIR measurement will be useful in developing high insulating oxide films for microelectronic devices.Aluminum metal and its alloys have begun to be widely used for the production of high quality thin-film transistor liquid crystal displays, because high resolution and large screen size panels require a low resistivity interconnection material. However, aluminum interconnects have a serious problem of hillock formation during heating. Recently, it was suggested that hillocks are considerably suppressed by adding a small amount of neodymium. 1,2 Thereafter, Al-Nd alloy has become one of the best interconnection materials for high quality liquid crystal displays. The processes of covering aluminum interconnects with various overlayers have been developed to suppress hillocks. 3-7 Among such overlayers, Al 2 O 3 films formed by anodization suppress hillocks effectively. Moreover, anodic films have very low pinhole density. Therefore, it seems better to use an Al-Nd alloy for interconnection material and an anodic alumina for its cap overlayer. For anodizing aluminum interconnects, a mixture of tartaric acid aqueous solution and ethylene glycol neutralized with an ammonia aqueous solution have been used as an electrolyte solution, since the resultant films have good electrical properties. 5-7 However, in relation to the design of thin-film transistor devices, further improvement is still required.We have reported on the anodization of pure aluminum and aluminum alloys in nonaqueous electrolyte solutions. 8-11 When anodizing aluminum in nonaqueous electrolyte solution, carbon species originating from the electrolyte solution incorporate into the anodic oxide film. Using an aqueous electrolyte solution, which contains organic anions, carbon species also incorporate into the anodic film, but the amount is much smaller. 11 The electrical properties of the anodic oxides were highly affected by the incorporated carbon species, even when the amount of carbon incorporated was relatively low. 10,11 Therefore, it is important to control the amount of carbon incorporated by anodization condition, when an anodic oxide film is used as the overlayer of interconnects. In this study, insulating properties of anodic films formed in nonaqueous electrolyte solutions at various forming current densities were examined. ExperimentalSubs...

show abstract

Section: Resultsmentioning

confidence: 91%

Section: Resultsmentioning

confidence: 99%

mentioning

confidence: 99%

mentioning

confidence: 99%

See 2 more Smart Citations

Formation and Electric Properties of Anodic Oxide Films on Al-Nd Sputtered Films in Nonaqueous Electrolyte Solutions

Mizutani

Takeuchi

Takaha

et al. 2001

J. Electrochem. Soc.

View full text Add to dashboard Cite

show abstract

“…One of them is to use a cap layer with transition metals such as molybdenum or titanium [12]. Evidences of reduced defects because of the anodized Al 2 O 3 layer on aluminum interconnect are also available [13]. However, the most effective means of reducing the defect formation is believed to be the alloying of aluminum with rare earth or transition elements [3][4][5].…”

Section: Introductionmentioning

confidence: 99%

Microstructure, texture and tensile properties of aluminum–2at.% neodymium alloy as used in flat panel displays

Sarkar¹,

Saimoto

Mathew³

et al. 2009

Journal of Alloys and Compounds

View full text Add to dashboard Cite

The preparation and corrosion resistance of Ce and Nd modified anodic films on aluminum

Tang

Zuo

2010

Materials Chemistry and Physics

View full text Add to dashboard Cite

Anodization of Al–Nd alloy films in nonaqueous electrolyte solutions for TFT-LCD application

Cited by 11 publications

References 27 publications

Formation and Electric Properties of Anodic Oxide Films on Al-Nd Sputtered Films in Nonaqueous Electrolyte Solutions

Formation and Electric Properties of Anodic Oxide Films on Al-Nd Sputtered Films in Nonaqueous Electrolyte Solutions

Microstructure, texture and tensile properties of aluminum–2at.% neodymium alloy as used in flat panel displays

The preparation and corrosion resistance of Ce and Nd modified anodic films on aluminum

Contact Info

Product

Resources

About