2012
DOI: 10.1016/j.electacta.2012.06.126
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Anodic film growth on Al–Li–Cu alloy AA2099-T8

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Cited by 42 publications
(33 citation statements)
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“…Cavities and regions of altered film morphology are evident on the surface and associated to the different oxidation behavior of the various metallurgical phases present on the alloy. 23,29,30 After sealing in hot water (Fig. 10b), the surface morphology did not appear substantially different from the one observed on the asanodized specimen.…”
Section: Resultsmentioning
confidence: 98%
“…Cavities and regions of altered film morphology are evident on the surface and associated to the different oxidation behavior of the various metallurgical phases present on the alloy. 23,29,30 After sealing in hot water (Fig. 10b), the surface morphology did not appear substantially different from the one observed on the asanodized specimen.…”
Section: Resultsmentioning
confidence: 98%
“…A fine void is shown in the anodic film formed on the alkaline etched specimen (indicated by the arrow in Figure 10b), with an alloy ridge at the film/alloy interface below the void and a protrusion of the film above the void. From previous work, 20,28,29 it is known that this void and voids observed later within the anodic film are oxygen gas-filled voids formed as a consequence of copper enrichment, oxidation and associated oxygen gas generation. This observation suggests that oxygen gas-filled voids have developed in the very early stages of anodizing for the alkaline etched specimen due to the presence of copper enriched layer developed during alkaline etching.…”
Section: Resultsmentioning
confidence: 94%
“…In contrast, the anodic film formed on alkaline etched specimen shows irregular pore morphology, with lateral porosity present in the cell boundary regions of the major pores (indicated by the arrows). According to previous work, 17,18,20,[24][25][26] the lateral porosity originates from oxidation of copper and associated generation of oxygen gas-filled voids during anodizing. Therefore, it is implied that the level of copper in the copper-enriched layer of the mechanically polished specimen is insufficient for oxidation of copper after anodizing for 20 s; conversely, a sufficient level of copper has been established in the copper-enriched layer of alkaline etched specimen and, therefore, oxidation of copper and associated generation of oxygen gas-filled voids occurred.…”
Section: Resultsmentioning
confidence: 98%
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“…10 shows the theoretical structure of such type of anodic film. A key characteristic of the coating is the presence of an inner oxide layer, which is due to aluminum reaction with the oxygen of the environment, and of an outer oxide layer, which is due to the treatment and is consisted mainly of alumina and embedded anions [27,28].…”
Section: Eis Analysismentioning
confidence: 99%