Abstract:GaP(111)B substrate was strewn with 30 nm colloidal Au nanoparticles. Organic residues were removed by: A) boiling in acetone and isopropylalcohol followed by a DI water rinse, B) treatment A + HF:H2O, C) treatment A + O2 plasma for 10 min, 20 min, and 40 min, and D) treatment A combined with O2 plasma (10 min) and HF:H2O. The substrate thus had original ‘epi‐ready' oxides (A), or fresh native oxides (B and D), or new added oxides (C). The samples were annealed at Ta = 650 °C for 10 min under PH3 and H2 in an … Show more
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