2020
DOI: 10.1016/j.tsf.2019.137782
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Annealing dependence of structural and optical properties of Zr-doped ZnO films deposited by radio frequency magnetron co-sputtering

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Cited by 3 publications
(2 citation statements)
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“…Thin films (TFs) are considered a type of nanomaterial in which the resulting crystallinity and morphology can be fine‐tuned relatively easily 12,13 . There are many methods to fabricate TFs, for example, thermal evaporation, 14 chemical bath deposition, 15 spray pyrolysis, 16 atomic layer deposition, 17 and radio frequency (RF) magnetron co‐sputtering 18–20 . Among them, RF magnetron co‐sputtering has striking advantage of obtaining uniform TFs at a high deposition rate with precisely controlled elemental compositions 21,22 …”
Section: Introductionmentioning
confidence: 99%
“…Thin films (TFs) are considered a type of nanomaterial in which the resulting crystallinity and morphology can be fine‐tuned relatively easily 12,13 . There are many methods to fabricate TFs, for example, thermal evaporation, 14 chemical bath deposition, 15 spray pyrolysis, 16 atomic layer deposition, 17 and radio frequency (RF) magnetron co‐sputtering 18–20 . Among them, RF magnetron co‐sputtering has striking advantage of obtaining uniform TFs at a high deposition rate with precisely controlled elemental compositions 21,22 …”
Section: Introductionmentioning
confidence: 99%
“…Furthermore, Zr 4+ (ionic radius of 0.742 Å) and Zn 2+ (ionic radius of 0.745 Å) ions have similar radii and Zr is an n-type doping impurity; thus, it can increase the carrier density in ZnO thin films. (24)(25)(26) Many methods, such as sputtering, pulsed laser deposition (PLD), and the sol-gel method, (27,28) can be used for depositing ZnO thin films. Sputtering is advantageous over the other methods for preparing uniform and large-area films with higher quality.…”
Section: Introductionmentioning
confidence: 99%