1998
DOI: 10.1143/jjap.37.3282
|View full text |Cite
|
Sign up to set email alerts
|

Annealing Behavior of Deep Trap Level in p-GaTe

Abstract: The deep levels in GaTe single crystal have been investigated by deep-level transient spectroscopy measurements. The hole-trapping level is detected at 0.8 eV above the valence band. It is found that the deep level is associated with the defect or defect complex and the concentration increases with increasing annealing temperature.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3

Citation Types

7
23
0

Year Published

2009
2009
2020
2020

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 14 publications
(30 citation statements)
references
References 7 publications
7
23
0
Order By: Relevance
“…Therefore, it is reasonable to believe that the defect associated with peak C is the same type defect reported in Ref. 4. The defects associated with peaks A and B had never been reported.…”
supporting
confidence: 56%
See 4 more Smart Citations
“…Therefore, it is reasonable to believe that the defect associated with peak C is the same type defect reported in Ref. 4. The defects associated with peaks A and B had never been reported.…”
supporting
confidence: 56%
“…[1][2][3][4][5][6][7][8][9][10][11][12] The band-gap energy of GaTe at room temperature is around 1.7 eV. This value is ideal for room-temperature x-ray and gamma-ray radiation detector applications.…”
Section: Introductionmentioning
confidence: 99%
See 3 more Smart Citations