Abstract:Infrared spectroscopic ellipsometry (IRSE) was applied for characterization of porous silicon (PSi) electrochemically prepared in acidic fluoride solution. When no formation of SiO2 was involved in the preparation, an anisotropic distribution of PSi bonds with the terminating molecules was achieved. On the contrary, oxidation of PSi samples during the preparation led to an isotropic structure. IR spectra obtained from organically functionalized PSi surfaces suggested that the morphology of the organic layer on… Show more
“…It is noticed that the measured tan Ψ data exhibit peak-shapes characteristic of the response of thin films with uniaxial anisotropy when deposited on metallic and semiconducting surfaces. 12,25 Specifically, tan Ψ data obtained from TCC on Au surfaces exhibit two peak-down features while on SiO 2 /Si, the response results in peak-up and peak-down features. This is typical for materials with anisotropic dielectric functions: the peak-up features in tan Ψ spectra from thin anisotropic films deposited on nonmetallic surfaces are due to the electronic transition dipole moments parallel to the surface and peak-down features are due to those perpendicular to the surface.…”
Section: ■ Methodsmentioning
confidence: 99%
“…A recent reflectance and transmittance study of thin films of so-called TDBC J-aggregates reported a very substantial peak value ≃10 6 cm –1 of the absorption coefficient. This finding highlights the potential of these materials for applications in optoelectronic devices and calls for more detailed studies of thin-film properties by methods that can detect anisotropy while relaxing the isotropic distribution assumption. − A good example of such approach is ellipsometric measurements of nonaggregated copper phtalocyanine thin films, which were found to exhibit uniaxial anisotropy. Moreover, it was reported that even the small difference in the molecular tilt angle can lead to pronounced differences in the anisotropic dielectric response.…”
Optical properties of thin films
of aggregated thiacarbocyanine
(TCC) dyes have been studied by means of spectroscopic ellipsometry
and polarized IR spectroscopy. The experimental results reveal a strongly
anisotropic response of the films, as quantified in the reported anisotropic
dielectric functions over a wide range of frequencies. The studied
TCC films exhibit both J-aggregate and H-aggregate absorption bands
with different polarization properties. A strong dielectric resonance
arising from the J-aggregate electronic excitations was found to be
polarized along the film. The observations are consistent with the
preferential orientation of aggregate filaments along the films. We
have also used the measured anisotropic properties in model calculations
of energy transfer into thin films of J-aggregates to illustrate the
potential importance of accurate optical characterization in engineering
aggregate-based hybrid nanostructures for optoelectronic applications.
“…It is noticed that the measured tan Ψ data exhibit peak-shapes characteristic of the response of thin films with uniaxial anisotropy when deposited on metallic and semiconducting surfaces. 12,25 Specifically, tan Ψ data obtained from TCC on Au surfaces exhibit two peak-down features while on SiO 2 /Si, the response results in peak-up and peak-down features. This is typical for materials with anisotropic dielectric functions: the peak-up features in tan Ψ spectra from thin anisotropic films deposited on nonmetallic surfaces are due to the electronic transition dipole moments parallel to the surface and peak-down features are due to those perpendicular to the surface.…”
Section: ■ Methodsmentioning
confidence: 99%
“…A recent reflectance and transmittance study of thin films of so-called TDBC J-aggregates reported a very substantial peak value ≃10 6 cm –1 of the absorption coefficient. This finding highlights the potential of these materials for applications in optoelectronic devices and calls for more detailed studies of thin-film properties by methods that can detect anisotropy while relaxing the isotropic distribution assumption. − A good example of such approach is ellipsometric measurements of nonaggregated copper phtalocyanine thin films, which were found to exhibit uniaxial anisotropy. Moreover, it was reported that even the small difference in the molecular tilt angle can lead to pronounced differences in the anisotropic dielectric response.…”
Optical properties of thin films
of aggregated thiacarbocyanine
(TCC) dyes have been studied by means of spectroscopic ellipsometry
and polarized IR spectroscopy. The experimental results reveal a strongly
anisotropic response of the films, as quantified in the reported anisotropic
dielectric functions over a wide range of frequencies. The studied
TCC films exhibit both J-aggregate and H-aggregate absorption bands
with different polarization properties. A strong dielectric resonance
arising from the J-aggregate electronic excitations was found to be
polarized along the film. The observations are consistent with the
preferential orientation of aggregate filaments along the films. We
have also used the measured anisotropic properties in model calculations
of energy transfer into thin films of J-aggregates to illustrate the
potential importance of accurate optical characterization in engineering
aggregate-based hybrid nanostructures for optoelectronic applications.
“…2 is an important step in silicon functionalization, most of the reactions summarized in the top part of the figure have already been previously subjected to comprehensive reviews. The analysis of silicon modification schemes involving radicals, 1,14,[28][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43] chemomechanical functionalization, 17 and reactions of carefully prepared partially covered silicon surfaces 2,5,15,44,[45][46][47][48][49][50][51] will not be the focus of this review. Instead, we will concentrate on the most recent studies of thermally induced (primarily condensation) reactions of organic compounds with H-terminated silicon surfaces, interactions of metal-organic compounds with the same surfaces, and surface reactivity of ammonia-exposed silicon, prepared according to the last pathway depicted in Fig.…”
Section: I3 Expected General Trends In Surface Reactivitiesmentioning
As the cornerstone of multiple practical applications, silicon single crystal surfaces have attracted the interest of scientific and engineering communities for several decades. The most recent advances employ the surfaces precovered with a specific functionality to extend into the realm of organic and metal-organic films with well-defined interfaces, to protect the surfaces from oxidation and other contaminations, and to build the components of present and future molecular electronics and sensing devices. This critical review will focus on the reactivity of the selectively terminated Si(100) and Si(111) surfaces. The hydrogen and halogen-terminated surfaces are the most widely used and most heavily reviewed previously, thus only a brief summary will be given here with the emphasis of the most recent thermal approaches to functionalization of hydrogen-terminated silicon. The silicon surfaces precovered with NH(x) functionality are emerging as a very likely candidate both for the production of sharp interfaces and for coadsorption, co-assembly, and potential molecular templating of patterns on single crystalline surfaces. A brief overview of recent advances in achieving control over the hydroxyl-termination of silicon will be given. Some future directions for further development of chemistry, reactivity, and assembly on these surfaces, as well as potential applications, are highlighted in the last section (152 references).
“…Moreover, up to now only one report on methyl-terminated porous Si surfaces using the infrared ellipsometry spectroscopy (IRSE) technique is available. 18 IRSE has been shown to be extremely sensitive and permits an unambiguous identification of monolayer coverage. This paper shows for the first time the vibrational shift of the "umbrella" symmetric deformation mode between CH 3 and CD 3 groups grafted onto H-terminated Si(111) surfaces using the IRSE spectroscopic method.…”
A one-step electrochemical grafting process using Grignard reagents has been performed to achieve a complete monolayer methyl-terminated Si(111) surfaces. Anodic treatment (0.5 mA/cm 2 for 300 s) has been applied to atomically flat Hterminated Si(111) surfaces in methylmagnesium bromide (CH 3 MgBr), methylmagnesium iodide (CH 3 MgI), and methyl-d 3magnesium iodide (CD 3 MgI) to obtain methylated Si(111) surfaces. Infrared spectroscopic ellipsometry (IRSE) clearly reveals a vibrational shift of the symmetric "umbrella" mode characteristic for methyl groups (CH 3 and CD 3 ) with a preferential zorientation. Additionally, X-ray photoelectron spectroscopy using synchrotron radiation (SXPS) shows a well-defined splitting of the Si 2p core level spectra from the methylated Si(111) surfaces. This splitting is more pronounced for the CD 3 -terminated Si(111) surfaces. Moreover, the C 1s spectra also confirm the well-defined structure of the CD 3 -terminated Si(111) surfaces by the presence of C−D vibrational stretching features. Photoluminescence (PL) measurements reveal better surface passivation in the case of CD 3 -terminated Si(111) surfaces. Finally, the quality of the surfaces depends strongly on the counterions. Grignard reagents containing iodine show the best performance in the formation of complete monolayer methylated Si(111) surfaces.
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