2005
DOI: 10.1016/j.sna.2004.06.003
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Anisotropy in fracture of single crystal silicon film characterized under uniaxial tensile condition

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Cited by 45 publications
(21 citation statements)
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“…[16,32] the prenotch was machined straight down in the central part of the sample only, leaving two side walls that formed a precrack when bend-testing thin film samples of silicon oxide, nitride or oxynitride. Testing of small-scale beams containing FIB-premachined notches has been shown in several studies to give K c values near those found for macroscopic samples [15][16][17]26,27]; however, in many other studies, different results, ranging from values slightly to much higher [11,18,19,[21][22][23][24]30,33], or in some cases lower [20,34], than the toughness data from tests on macroscopic specimens of the same material were obtained with FIB-notched specimens.…”
Section: Introductionmentioning
confidence: 89%
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“…[16,32] the prenotch was machined straight down in the central part of the sample only, leaving two side walls that formed a precrack when bend-testing thin film samples of silicon oxide, nitride or oxynitride. Testing of small-scale beams containing FIB-premachined notches has been shown in several studies to give K c values near those found for macroscopic samples [15][16][17]26,27]; however, in many other studies, different results, ranging from values slightly to much higher [11,18,19,[21][22][23][24]30,33], or in some cases lower [20,34], than the toughness data from tests on macroscopic specimens of the same material were obtained with FIB-notched specimens.…”
Section: Introductionmentioning
confidence: 89%
“…The radii of the resulting notch roots range from a few tens to several hundreds of nanometres (e.g. [11,[14][15][16][17][18][19][20][21][22][23][24][25][26][27][28][29][30][31]). Beyond the need to produce a notch of sufficient sharpness, another difficulty with ion milling lies in producing a uniform notch depth and/or width: for this reason, in Refs.…”
Section: Introductionmentioning
confidence: 99%
“…Thus, Chen and Leipold [195] measured the fracture toughness of single-crystal silicon using the controlled surface fracture method, and reported the values of 0.82, 0.90 and 0.95 Mpam 1/2 for the {111}, {110} and {100} orientations, respectively (Table 9.20). Later, Li et al [197] used a uniaxial tensile test with single-edge-notched tension specimen (Figure 9.16) and the following formula to estimate K Ic as a function of fracture tensile stress, σ f , notch length a, and the geometry of the specimen:…”
Section: General Remarksmentioning
confidence: 99%
“…Nonetheless, this experiment completely confirmed the anisotropy of fracture toughness in microscale single-crystal silicon observed earlier. Moreover, Li et al [197] also demonstrated an anisotropy of the fracture path in single-crystal silicon, where cracks propagate predominantly on {111} and {110} low index 60 90 Orientation angle planes. At the same time they have shown that fracture paths never occur on the (001) cleavage plane.…”
Section: General Remarksmentioning
confidence: 99%
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