Anisotropic silicon nanowire arrays fabricated by colloidal lithography

Rey, Marcel; Wendisch, Fedja J.; Goerlitzer, Eric S. A.; Tang, Jo Sing Julia; Bader, Romina Sigrid; Bourret, Gilles R.; Vogel, Nicolas

doi:10.1039/d1na00259g

Cited by 22 publications

(23 citation statements)

References 67 publications

(120 reference statements)

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“… Summary of our work to structure and pattern VA-SiNW arrays in 3D via colloidal lithography, MACE, and 3DEAL. Modified from refs ( 11 ), ( 33 ), and ( 42 ) (copyright 2017, 2018, 2020, respectively, American Chemical Society), and adapted from ref ( 44 ) (2021, CC BY 3.0). …”

Section: Structuring and Patterning Silicon Nanowires In 3d For Spati...mentioning

confidence: 99%

“…(d–f) Elliptical cross-sections: Deposition of the metal layer under an oblique angle results in an elliptical shadowing effect, leading to SiNWs with controllable elliptical morphologies after MACE. Adapted from ref ( 44 ) (2021, CC BY 3.0). Schemes (a, d) and secondary electron SEM images (b, c, e, f).…”

Section: Structuring and Patterning Silicon Nanowires In 3d For Spati...mentioning

confidence: 99%

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Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Bartschmid

Wendisch

Farhadi

et al. 2021

ACS Appl. Energy Mater.

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Vertically aligned silicon nanowire (VA-SiNW) arrays can significantly enhance light absorption and reduce light reflection for efficient light trapping. VA-SiNW arrays thus have the potential to improve solar cell design by providing reduced front-face reflection while allowing the fabrication of thin, flexible, and efficient silicon-based solar cells by lowering the required amount of silicon. Because their interaction with light is highly dependent on the array geometry, the ability to control the array morphology, functionality, and dimension offers many opportunities. Herein, after a short discussion about the remarkable optical properties of SiNW arrays, we report on our recent progress in using chemical and electrochemical methods to structure and pattern SiNW arrays in three dimensions, providing substrates with spatially controlled optical properties. Our approach is based on metal-assisted chemical etching (MACE) and three-dimensional electrochemical axial lithography (3DEAL), which are both affordable and large-scale wet-chemical methods that can provide a spatial resolution all the way down to the sub-5 nm range.

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Section: Structuring and Patterning Silicon Nanowires In 3d For Spati...mentioning

confidence: 99%

Section: Structuring and Patterning Silicon Nanowires In 3d For Spati...mentioning

confidence: 99%

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Bartschmid

Wendisch

Farhadi

et al. 2021

ACS Appl. Energy Mater.

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“…19,20 Furthermore, the interfacial assembly can be transferred onto solid substrates to obtain nanoscale surface patterns with high fidelity over macroscopic areas 21,22 which are exploited in photonic 23,24 or phononic 25,26 applications, or serve as a template for the fabrication of more complex plasmonic nanostructure- 27–29 or nanowire arrays. 26,30–32…”

Section: Introductionmentioning

confidence: 99%

Interfacial self-assembly of SiO₂–PNIPAM core–shell particles with varied crosslinking density

et al. 2022

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“…Side‐view SEM images were also taken by tilting the samples ≈30° away from the cross‐sectional orientation to better analyze the MPGO morphology. [ 26 ] These images (Figure 2e–h) show that the MPGO had three parts: a GO bottom layer, partially interconnected GO vertical “walls” (of 5–6 µm in height as seen in Figure 2e), and a thin micropore surface morphology located on top of the walls. Other works have reported similar polymer structures emerging from BF fabrication.…”

Section: Resultsmentioning

confidence: 99%

Self‐Assembly of Adjustable Micropatterned Graphene Oxide and Reduced Graphene Oxide on Porous Polymeric Surfaces

Wang

Huang

Yaniv

et al. 2022

Adv Materials Inter

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surface area. [2,3] Much of the research on micropatterning is inspired by nature (i.e., biomimetic surfaces), with honeycomb morphology being one of the most interesting. This structure is ubiquitous, being found in bee and wasp nests, tripe, bone, compound eyes of insects, snowflakes, coral, pineapples, and the Giant's Causeway, and has been studied for thousands of years. Many different materials with microhoneycomb morphologies have been investigated for their potential use in fields such as biological research, templates, electronics, catalysis, and optics. [4,5] Specifically, carbon nanomaterials, such as carbon nanotubes (CNTs) and graphene oxide (GO), have been used to obtain microhoneycomb-patterned CNTs [6] and GO [7] surfaces due to their advanced electronic, mechanical, and thermal properties. [8] Micropatterned surfaces are commonly fabricated by emulsion templating [9] (photo)lithography [10] and phase separation micromolding. [11] However, these technologies can be relatively complicated. For example, (photo)lithography uses much energy and complex instruments. Emulsions are thermodynamically unstable and short-lived. The templates for micromolding can be difficult to develop or remove.The breath figure (BF) is a universal natural phenomenon that involves the condensation of water vapor that selfassembles into an array of water droplets on a cold surface. Inspired by this, the BF has been explored as a method to prepare micropatterned morphologies, including microhoneycombThe breath figure (BF) method is a simple technique for fabricating micropatterned surfaces but has been rarely studied using graphene oxide (GO) or reduced GO (rGO). Additionally, fabrication of GO or rGO micropatterned (MPGO or MPrGO) by the BF method focuses on smooth and dense inorganic substrates, and the investigation of adjusting the MPGO morphology has been limited. This research systematically studies self-assembly of MPGO and MPrGO on the surface of two model porous polymers by the BF method and explores its potential applications for surface modification. It is found that the size range of the MPGO is 1-50 µm and that the structures can be adjusted by changing the process parameters. Specifically, under specific conditions, a uniform honeycomb MPGO is obtained. Surface characteristics demonstrate that the unique MPGO morphology alters the surface water contact-angle from ≈65° to ≈100° and that MPrGO decreases the surface resistivity to 1-5 kΩ cm −2 . Additionally, MPGO coating on a microfiltration membrane gives it a much greater permeability than GO coating without micropatterned morphology and antibiofilm properties. Overall, this study shows that MPGO and MPrGO with adjustable morphologies are easily obtained on polymeric surfaces, thus altering the surface properties and giving the polymers various potential applications.

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Anisotropic silicon nanowire arrays fabricated by colloidal lithography

Abstract: The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays...

Cited by 22 publications

References 67 publications

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Interfacial self-assembly of SiO₂–PNIPAM core–shell particles with varied crosslinking density

Self‐Assembly of Adjustable Micropatterned Graphene Oxide and Reduced Graphene Oxide on Porous Polymeric Surfaces

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Anisotropic silicon nanowire arrays fabricated by colloidal lithography

Abstract: The combination of metal-assisted chemical etching (MACE) and colloidal lithography allows for the affordable, large-scale and high-throughput synthesis of silicon nanowire (SiNW) arrays. However, many geometric parameters of these arrays...

Cited by 22 publications

References 67 publications

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Recent Advances in Structuring and Patterning Silicon Nanowire Arrays for Engineering Light Absorption in Three Dimensions

Interfacial self-assembly of SiO2–PNIPAM core–shell particles with varied crosslinking density

Self‐Assembly of Adjustable Micropatterned Graphene Oxide and Reduced Graphene Oxide on Porous Polymeric Surfaces

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Interfacial self-assembly of SiO₂–PNIPAM core–shell particles with varied crosslinking density