“…However, there are still many issues to be solved on the material level, and the governing theory is not as mature as, for instance, for Si, e.g., electrical activation of impurities, , SiC/SiO 2 interface defects, and orientation-dependent oxidation. − These shortcomings require analyses on the microscopic levels, which will lead to performance improvements of SiC devices, e.g., inversion channel mobility and gate oxide stability, in order to further reduce the on-resistance and enhance the gate reliability . In particular, a detailed understanding of the atomic and molecular interactions of oxygen (O) and SiC will enable advances in SiC oxidation processes and thus assist in the goal of maximizing the efficiency of SiC devices and the corresponding device manufacturing processes. , …”