2017
DOI: 10.1016/j.sse.2016.10.032
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Anisotropic interpolation method of silicon carbide oxidation growth rates for three-dimensional simulation

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Cited by 7 publications
(7 citation statements)
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“…Furthermore, the differences in growth rates between the various faces have been observed to be decreasing with time. This study contributes to the development of orientationdependent SiC oxidation models, 10 which are fundamental for device fabrication simulators, e.g., Silvaco's Victory Process simulator. 49 It is crucial for device fabrication to accurately predict oxidation growth of SiC incorporating the geometry of the oxide in modern electron devices, which require intricate oxide geometries.…”
Section: ■ Conclusionmentioning
confidence: 99%
See 1 more Smart Citation
“…Furthermore, the differences in growth rates between the various faces have been observed to be decreasing with time. This study contributes to the development of orientationdependent SiC oxidation models, 10 which are fundamental for device fabrication simulators, e.g., Silvaco's Victory Process simulator. 49 It is crucial for device fabrication to accurately predict oxidation growth of SiC incorporating the geometry of the oxide in modern electron devices, which require intricate oxide geometries.…”
Section: ■ Conclusionmentioning
confidence: 99%
“…However, there are still many issues to be solved on the material level, and the governing theory is not as mature as, for instance, for Si, e.g., electrical activation of impurities, , SiC/SiO 2 interface defects, and orientation-dependent oxidation. These shortcomings require analyses on the microscopic levels, which will lead to performance improvements of SiC devices, e.g., inversion channel mobility and gate oxide stability, in order to further reduce the on-resistance and enhance the gate reliability . In particular, a detailed understanding of the atomic and molecular interactions of oxygen (O) and SiC will enable advances in SiC oxidation processes and thus assist in the goal of maximizing the efficiency of SiC devices and the corresponding device manufacturing processes. , …”
Section: Introductionmentioning
confidence: 99%
“…Currently, obtaining three-dimensional discrete data of soil salinity through electromagnetic induction inversion models is one of the main ways to map 3D spatial variability of soil salinity [25,40]. An interpolation method can be used to estimate the target variables at non sampling sites [25,42]. Presently, the commonly used three-dimensional interpolation methods are mostly extended from the two-dimensional interpolation methods including IDW and Kriging.…”
Section: Model Performancementioning
confidence: 99%
“…(d)) and a 500 nm thick aluminum film is deposited on the SiO2 layer before the focused ion-beam (FIB) treatment. The TEM lamella is oriented along [11][12][13][14][15][16][17][18][19][20], perpendicular to the step-flow of the epitaxial layer and taken from a region of the sample where isolated macrosteps are present (Fig. 2 (a,b)).…”
Section: Oxidation At Isolated Macrostepsmentioning
confidence: 99%
“…In order to achieve electronic-grade homoepitaxies of a single polytype, an off-axis growth technique is normally applied [1], leading to microsteps along the surface [2]. Even though a range of different off-angles and tilt directions has been reported [3], the most commonly employed off-angle is 4° toward the [11][12][13][14][15][16][17][18][19][20] direction. For the (0001) Si-face, the surface exhibits a continuous step pattern with most of the microsteps having a height of either 2 or 4 bilayers [4].…”
Section: Introductionmentioning
confidence: 99%