Anisotropic etching behavior and topography formation mechanism of silicon solar cell surface textured by atmospheric plasma
Peng Zhang,
Hengxi Tian,
Jinwei Liu
et al.
Abstract:Atmospheric plasma etching (APE) has been used to texture Si surfaces due to anisotropic material removal capability. Controlling features and size of the light-trapping structure are keys to improving the reflection performance of silicon (Si) solar cells, which need to fully understand the interfacial etching behavior and the microscopic topography formation mechanism of the Si surface. In this study, microwave plasma with a temperature below 100 °C is employed to investigate the dependence of microstructure… Show more
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