Ti-deficient SrTixO3−δ films, x<1, were grown on 〈100〉 oriented SrTiO3 single crystal substrates by radio frequency magnetron sputtering from stoichiometric targets. The Ti-deficiency was adjusted by the sputtering gas pressure. The Ti/Sr cation ratio, x, was determined by Rutherford backscattering and energy dispersive x-ray analysis in a scanning electron microscope. To obtain information on the Ti/O ratio, x-ray absorption spectroscopy was carried out as well. We investigated SrTixO3−δ films with x=0.98, 0.95, and 0.89. The epitaxial growth and lattice imperfections were characterized by x-ray diffraction, electron diffraction, and high resolution transmission electron microscopy. The films crystallized in a tetragonal structure with a maximum mosaic spread of about 0.1°. The c axis was oriented perpendicular to the substrate surface where the c-lattice parameter was increasing with decreasing x. For x>0.89, the Ti deficiency was primarily compensated by a change of the site occupation on the cation sublattices in combination with oxygen vacancies, i.e., the formation of SrTi and VO point defects, whereas for x<0.95 the intergrowth of homologs series of the Ruddlesden–Popper phases, Srn+1TinO3n+1, was observed. The dielectric properties of the films are briefly discussed in terms of (SrTiVO) defect complexes.