1998
DOI: 10.1021/la980812x
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Anisotropic Dissolution of an Au(111) Electrode in Perchloric Acid Solution Containing Chloride Anion Investigated by in Situ STMThe Important Role of Adsorbed Chloride Anion

Abstract: The anodic dissolution process of Au(111) in a 0.1 M perchloric acid (HClO4) solution containing chloride anion (Cl-) was investigated using an in situ scanning tunneling microscope. The initial dissolution of gold was observed at the step sites when the electrode potentials became more positive than +1.0 V. The rate of the anodic dissolution increased as the potential became more positive. When the potential became more positive than +1.35 V, dissolution on the terraces was also observed. The dissolution of A… Show more

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Cited by 78 publications
(89 citation statements)
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References 36 publications
(55 reference statements)
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“…Water was purified using a Milli-Q system (Yamato, WQ-500). Ultrapure N 2 was purchased from Tomoe Shokai Co., Ltd. A Au(111) single crystal disk was purchased from Surface Preparation Laboratory and was used after the treatments as previously reported 3 [40,41]. Prior to each measurement, the Au(111) disk was flame annealed using a Bunsen burner and slowly cooled in air.…”
Section: Methodsmentioning
confidence: 99%
“…Water was purified using a Milli-Q system (Yamato, WQ-500). Ultrapure N 2 was purchased from Tomoe Shokai Co., Ltd. A Au(111) single crystal disk was purchased from Surface Preparation Laboratory and was used after the treatments as previously reported 3 [40,41]. Prior to each measurement, the Au(111) disk was flame annealed using a Bunsen burner and slowly cooled in air.…”
Section: Methodsmentioning
confidence: 99%
“…In this section, the discussion will be concentrated on the anisotropic layer-by-layer dissolution behavior of noble metal electrodes, palladium and gold, catalyzed by an adlayer of adsorbate on the substrate. Similar anisotropic anodic dissolution processes catalyzed by the ordered adsorbed layer have also been observed on S-Ni(100), [106] I-Ni (111), [107] IAg(100) [108] and Cl-Cu(hkl) [109][110][111][112] as well as Cl-Au(hkl) [29][30][31], which will be discussed in the next section in detail.…”
Section: Atomically Controlled Dissolution Of Noble Metalsmentioning
confidence: 57%
“…When the crystallographic mismatch of the metal and the substrate is negligibly small, metallic layers are formed on the UPD layer on the substrate by a layer-by-layer growth, namely, the FM mode. When the crystallographic mismatch is relatively large, the UPD layer contains considerable internal strain, and therefore, the growth of the unstrained 3D metal islands on top of the strained UPD layers is energetically favored and this mechanism is called the [29][30][31] [32] [33][34][35][36] [37] [38][39][40] [ [41][42][43][44][45] [26] where A and B denote substrate and metal, respectively. Values in the table are calculated with respect to the gold substrate; c Lattice mismatches AB [26] are shown with respect to that of gold; d The surface-energy mismatches are calculated with respect to a gold substrate following the definition given by Bauer and coworkers [26] as: SK mode.…”
Section: Atomically Controlled Deposition Of Noble Metalsmentioning
confidence: 99%
“…[51][52][53] The roughness factor of the surface was estimated from the charge for the reduction of gold oxide to be less than 1.2. 52 The surface modifications of the Au(111) disk substrates were carried out by immersing the substrates in a benzene solution containing 50 µM (M = mol dm ¹3 ) TMMPP, which is a relatively low concentration, at RT for 1 min-90 h.…”
Section: Preparation Of the Tmmpp Sammentioning
confidence: 99%