2022
DOI: 10.1063/5.0087602
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Anisotropic dielectric function, direction dependent bandgap energy, band order, and indirect to direct gap crossover in α-(AlxGa1−x)2O3 (≤x≤1)

Abstract: Mueller matrix spectroscopic ellipsometry is applied to determine anisotropic optical properties for a set of single-crystal rhombohedral structure α-(Al xGa1− x)2O3 thin films (0 [Formula: see text] x [Formula: see text] 1). Samples are grown by plasma-assisted molecular beam epitaxy on m-plane sapphire. A critical-point model is used to render a spectroscopic model dielectric function tensor and to determine direct electronic band-to-band transition parameters, including the direction dependent two lowest-ph… Show more

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Cited by 9 publications
(9 citation statements)
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“…Some attempts to alloy the stable β-Ga 2 O 3 phase with Al have been made, [28][29][30][31][32][33] but this remains challenging since α-Al 2 O 3 does not share the same crystal structure and monoclinic Al 2 O 3 (θ-Al 2 O 3 ) remains obscure. 34) In contrast, alloying α-Ga 2 O 3 with Al by CVD, 35) pulsed laser deposition (PLD), 36) and MBE, 37) can provide single-crystal films especially when grown on m-plane sapphire. 38) c-plane Al 2 O 3 as substrate seems to lead to the formation of a few monolayers α-Ga 2 O 3 followed by β-Ga 2 O 3 , due to the large in-plane lattice mismatch between layer and substrate, observed in metalorganic CVD (MOCVD), MBE and PLD, but not in mist CVD or halide vapour phase epitaxy.…”
Section: Introductionmentioning
confidence: 99%
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“…Some attempts to alloy the stable β-Ga 2 O 3 phase with Al have been made, [28][29][30][31][32][33] but this remains challenging since α-Al 2 O 3 does not share the same crystal structure and monoclinic Al 2 O 3 (θ-Al 2 O 3 ) remains obscure. 34) In contrast, alloying α-Ga 2 O 3 with Al by CVD, 35) pulsed laser deposition (PLD), 36) and MBE, 37) can provide single-crystal films especially when grown on m-plane sapphire. 38) c-plane Al 2 O 3 as substrate seems to lead to the formation of a few monolayers α-Ga 2 O 3 followed by β-Ga 2 O 3 , due to the large in-plane lattice mismatch between layer and substrate, observed in metalorganic CVD (MOCVD), MBE and PLD, but not in mist CVD or halide vapour phase epitaxy.…”
Section: Introductionmentioning
confidence: 99%
“…Studies of the optical properties of α-(Al x Ga 1−x ) 2 O 3 taking into account the anisotropy are rare. Hilfiker et al investigated the optical absorption onset 34) and dielectric limits ε ∞ 51) by spectroscopic ellipsometry. Additionally Stokey et al 52) determined IR-active phonon modes and static dielectric constants with the same technique in the IR.…”
Section: Introductionmentioning
confidence: 99%
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“…In addition, the bandgap of Ga 2 O 3 can be tuned at a wide range using substitutional alloying on the Ga site by Group III elements. [6][7][8][9][10][11][12][13][14][15][16] For instance, it was shown theoretically that increasing the Al doping composition of Ga 2 O 3 linearly increases the bandgap of the semiconducting crystal. 6,7) On the other hand, In the case of In substitution, the bandgap decreases with increasing doping concentration.…”
Section: Introductionmentioning
confidence: 99%
“…6) The formation of α-(Al x Ga 1−x ) 2 O 3 alloys between isostructural α-Al 2 O 3 and α-Ga 2 O 3 allows for band gap engineering in a wide range up to 8.6 eV. 7,8) The crystal growth and fundamental properties of α-(Al x Ga 1−x ) 2 O 3 alloys have been studied both experimentally 5,[7][8][9][10][11][12] and theoretically [13][14][15] towards in-depth understanding and full utilization of their functionalities.…”
mentioning
confidence: 99%