“…Some attempts to alloy the stable β-Ga 2 O 3 phase with Al have been made, [28][29][30][31][32][33] but this remains challenging since α-Al 2 O 3 does not share the same crystal structure and monoclinic Al 2 O 3 (θ-Al 2 O 3 ) remains obscure. 34) In contrast, alloying α-Ga 2 O 3 with Al by CVD, 35) pulsed laser deposition (PLD), 36) and MBE, 37) can provide single-crystal films especially when grown on m-plane sapphire. 38) c-plane Al 2 O 3 as substrate seems to lead to the formation of a few monolayers α-Ga 2 O 3 followed by β-Ga 2 O 3 , due to the large in-plane lattice mismatch between layer and substrate, observed in metalorganic CVD (MOCVD), MBE and PLD, but not in mist CVD or halide vapour phase epitaxy.…”