2017
DOI: 10.1103/physrevb.96.245130
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Anisotropic dependence of the magnetic transition on uniaxial pressure in the Kondo semiconductors CeT2Al10 ( T=Ru

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Cited by 10 publications
(13 citation statements)
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“…Therefore, the metallization in Fe/Os-based CeT 2 Al 10 materials seems to be favored by both electron and hole doping. A similar feature in ρ(T ) is also seen for CeT 2 Al 10 (T = Ru and Os) under hydrostatic pressure [48]. The inset of Fig.…”
Section: A Crystal Structuresupporting
confidence: 74%
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“…Therefore, the metallization in Fe/Os-based CeT 2 Al 10 materials seems to be favored by both electron and hole doping. A similar feature in ρ(T ) is also seen for CeT 2 Al 10 (T = Ru and Os) under hydrostatic pressure [48]. The inset of Fig.…”
Section: A Crystal Structuresupporting
confidence: 74%
“…Upon applying pressure, the lattice parameters of CeT 2 Al 10 (T = Fe, Ru, Os) all decrease monotonically, but the response is anisotropic [55]. A decrease in the b axis lattice parameter under pressure leads to a concomitant increase in T N [48,55]. We therefore anticipate a difference in the properties of Ir and Rh-doped CeFe 2 Al 10 , due to the different behavior of the b axis lattice parameter with chemical substitution.…”
Section: A Crystal Structurementioning
confidence: 89%
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“…For hydrostatic pressures up to 1.34 GPa, a piston-cylinder pressure cell made of NiCrAl alloy and Daphne oil 7373 as a pressure transmitting medium were used. For uniaxial pressure of the configurations P B and P⊥B, two type of pressure cells were constructed [19]. Uniaxial pressures were applied on a sample plate of 0.4-0.7 mm in thickness by a homemade pressure cell made of ZrO 2 .…”
Section: Methodsmentioning
confidence: 99%
“…Since the semiconducting behavior of resistivity remains in the AFM ordered state and then disappears along with T N , the hybridization gap was thought to be essential for the unusual AFM order. Another puzzling feature is that application of P b strongly increases T N in CeT 2 Al 10 (T = Ru, Os) [47].…”
Section: Introductionmentioning
confidence: 99%