Anion Effects on Cu–benzotriazole Film Formation

Stewart, Karen L.; Zhang, Jian; Li, Shoutian; Carter, Phillip W.; Gewirth, Andrew A.

doi:10.1149/1.2393013

Cited by 41 publications

(37 citation statements)

References 65 publications

(113 reference statements)

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“…Subsequent thickening of the inhibiting layer is regarded to occur as Cu + species migrate through the Cu-BTAH layer which are necessary to form the Cu(I)-BTAH coordination polymer [71]. This study explores the application of scanning electrochemical microscopy to study the film formation and the stability of the protective film formed on copper by benzotriazole (BTAH).…”

Section: Introductionmentioning

confidence: 99%

Uses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: The protection of copper surfaces by benzotriazole

Izquierdo

Santana

González

2010

Electrochimica Acta

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a b s t r a c tScanning electrochemical microscopy (SECM) was used to study the film formation of benzotriazole towards corrosion of copper. SECM was operated in the feedback mode by using ferrocene-methanol as redox mediator, and the sample was left unbiased at all times to freely attain its open circuit potential in the test environment. Following exposure to aggressive electrolytes the anticorrosion abilities of the layers were characterized by image analysis and by an electrochemical method derived from the experimental approach curves. Changes in the shape of the approach curves were clearly observed during the inhibitor film formation process. They showed the transition from an active conducting behaviour towards ferrocinium reoxidation typical of unprotected copper, to a surface exhibiting insulating characteristics when the metal was covered by a surface film containing the inhibitor. This supports that SECM is a practical technique in the investigation of corrosion inhibitor performance. However, a consistent tendency for the characterization of inhibitor film formation using SECM measurements in the positive feedback mode for the copper-benzotriazole system was only found if the experiments were conducted when the inhibitor molecule was not present in the test solution. That is, inhibitor molecules were found to interact not only with the copper surface during the monitoring process, but with the SECM tip as well, this effect being significantly enhanced when chloride ions were present in the electrolyte. Finally, a procedure to image the chemical activity of copper surfaces partially covered with the inhibitor film with SECM is proposed.

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Section: Introductionmentioning

confidence: 99%

Uses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: The protection of copper surfaces by benzotriazole

Izquierdo

Santana

González

2010

Electrochimica Acta

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“…On the one hand, this film [Cu(I)-BTA] is a physical barrier screening the metal surface from the corrosive ions present in solution, and on the other hand, it binds copper atoms, preventing anodic dissolution and decreasing the electrical conductivity of the surface layer [7]. The following reactions [7][8][9][10] …”

Section: Resultsmentioning

confidence: 99%

Inhibition of copper local depassivation in alkaline media with oxygen-containing anions

2017

Int. J. Corros. Scale Inhib.

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Using complex physical and chemical methods, a comparative estimation of the capability of benzotriazole (BTAH) to act as an inhibitor of copper local activation (LA) was carried out in alkaline-nitrate and alkaline-sulphate solutions in a temperature range of 20-60°C. It was shown that in both systems studied, BTAH hinders copper LA according to an adsorption-polymerization mechanism. Furthermore, the effect is the stronger, the higher the temperature of the working solution is.

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“…The protective film can be additionally stabilized by incorporation of halide ions (Figure 6), moreover the film thickness increases in this case [7]. In alkaline medium, the copper surface contains oxide-hydroxide compounds (the fraction of which increases with temperature), and BTA -adsorption on oxide-coated metal surface is preferred and occurs sufficiently fast [8], probably due to the ability of oxygen atoms in the oxide (Cu-O-Cu) to form hydrogen bonds with hydrogen atoms of the benzotriazole anion (C-H).…”

Section: Addition Of 1·10mentioning

confidence: 93%

Effect of hydrodynamic conditions on copper pitting corrosion inhibition in hydrocarbonate–chloride solutions by benzotriazole

Skrypnikova¹,

Kaluzhina²

2015

Int. J. Corros. Scale Inhib.

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It has been found that in hydrocarbonate-chloride solutions (pH = 8.4) benzotriazole inhibits copper pitting corrosion. Comparative results obtained on stationary and rotating disc electrode have shown that rotation stabilizes the metal/electrolyte systems. Under drastic hydrodynamic conditions, the benzotriazole concentration required for full suppression of copper pitting corrosion was reduced 10-fold on a rotating disc.

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Anion Effects on Cu–benzotriazole Film Formation

Cited by 41 publications

References 65 publications

Uses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: The protection of copper surfaces by benzotriazole

Uses of scanning electrochemical microscopy for the characterization of thin inhibitor films on reactive metals: The protection of copper surfaces by benzotriazole

Inhibition of copper local depassivation in alkaline media with oxygen-containing anions

Effect of hydrodynamic conditions on copper pitting corrosion inhibition in hydrocarbonate–chloride solutions by benzotriazole

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