Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm

Zongshun, 曾宗顺 Zeng; Fang, 张方 Zhang; Zhiyuan, 牛志元 Niu; Xiaozhe, 马晓喆 Ma; Siyu, 朱思羽 Zhu; Huijie, 黄惠杰 Huang

doi:10.3788/cjl202047.0805003

Cited by 3 publications

(1 citation statement)

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“…In illumination system of lithography, the MMA is employed for the generation of optimal freeform illumination modes. The MMA consists of thousands of biaxial rotary micromirrors and reflects faculae to the designated positions in the customized illumination mode [6,7] . In order to generate ideal illumination modes, mirrors are actuated in a sufficient angle range of 2° with a angular error of less than 0.002°.…”

Section: Introductionmentioning

confidence: 99%

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Zhang,

Hu,

Zeng

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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Section: Introductionmentioning

confidence: 99%

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Zhang,

Hu,

Zeng

et al. 2023

AOPC 2023: Optical Design and Manufacturing

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High efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography

Chen,

Li,

Liu

2024

Appl. Opt.

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Source and mask optimization (SMO) is an important lithography resolution enhancement technique for 22 nm technology nodes and beyond in lithography. This technique generates freeform sources by adjusting the inclination angle of the micromirror array (MMA). In this paper, a high efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography is proposed. The number and inclination angles of micromirrors required for adjustment to convert the initial source into any illumination source are quickly and accurately obtained by using the proposed method. The illumination source is obtained on the pupil plane by adjusting the inclination angles of some micromirrors. The simulation results show that the initial source is converted into another illumination source with different complexities by adjusting some micromirrors. Compared with the traditional MMA allocation method, when the initial source is the freeform source, the regulation efficiency of micromirrors has been improved by at least 20%. The method reduces the regulation time of micromirrors and the number of micromirrors required for adjustment. Moreover, the number of micromirrors required for adjustment is positively correlated with the coherence coefficient. The results illustrate that this method is effective and has significant engineering implications.

show abstract

基于傅里叶合成技术的光刻照明系统研究

Hui¹,

Xiaobin²,

Xiaoquan³

et al. 2023

Chin. J. Laser

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Angular Position Distribution Algorithm of Micro Mirror Array Based on Genetic Algorithm

Cited by 3 publications

References 0 publications

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

Study on electrostatic rotation of the micromirror in illumination system under UV laser irradiation

High efficiency regulation method to generate an illumination source by adopting the micromirror array in DUV lithography

基于傅里叶合成技术的光刻照明系统研究

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