Angular distribution of atoms sputtered from amorphous and polycrystalline targets

Shulga, V. I.

doi:10.1016/s0168-583x(99)01172-6

Cited by 26 publications

(7 citation statements)

References 65 publications

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“…Therefore, we searched for a fitting function for n in the form (5) or (6) where N is the atomic density of the target (atoms/Å 3 ), E s is the surface binding energy (eV), and λ = 4M 1 M 2 /(M 1 + M 2 ) 2 is the energy transfer coefficient for a head on collision of a bombarding ion (mass M 1 ) and a target atom (mass M 2 ). Equations (5) and (6) take into account the fact that, when an angular distri bution of sputtered atoms forms, the last collision of an emitted atom with the nearest surface target atom plays a key role, which favors a narrowing of the sput tering indicatrix and an increase in n [17]. The angle of scattering in the last collision increases with decreas ing energy of escaping particles, which is related to both the bombarding ion energy and the surface bind ing energy.…”

Section: Resultsmentioning

confidence: 99%

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Angular distribution of atoms during the magnetron sputtering of polycrystalline targets

2012

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The angular distributions of atoms are measured during the dc magnetron sputtering of Mg, Al, Cu, Ag, Ta, Pt, Au, Ti, Cr, Zn, Zr, and Nb polycrystals by Ar ions with an energy up to 0.5 keV. These angular distributions are phenomenologically approximated, and adjustable parameters are found for each element. Computer simulation of sputtering based on the pair collision approximation is used to determine the coef ficient of proportionality between the magnetron discharge voltage and the average sputtering ion energy and to find the interatomic interaction potentials that provide the most accurate description of the experimental data. Both the angular distribution width and the sputtering coefficient are shown to have a periodic depen dence on the atomic number of the target Z 2 , and materials with the maximum sputtering coefficients have the narrowest distribution of sputtered atoms.

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Section: Resultsmentioning

confidence: 99%

“…We used the computer program from [5], which is based on the pair collision approximation and takes into account weak simultaneous interactions at large distances. A polycrystal is simulated by the rotation of a certain single crystal block, and the rotation proce dure was repeated for every new bombarding particle.…”

Section: Computer Simulationmentioning

confidence: 99%

Angular distribution of atoms during the magnetron sputtering of polycrystalline targets

2012

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“…Computer code OKSANA [22,23] used in this work is based on the binary-collision approximation and takes into account the weak simultaneous collisions at large distances. A disordered (amorphous) target was modeled by the rotation of a corresponding monocrystalline atomic block; the rotation procedure was repeated for each new collision.…”

Section: Computer Simulationmentioning

confidence: 99%

Relief evolution of HOPG under high-fluence 30keV argon ion irradiation

Andrianova

Борисов

Машкова

et al. 2015

Nuclear Instruments and Methods in Physics Research Section B:

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“…В расчётах использована компьютерная программа [10], основанная на приближении парных столкнове-ний и предусматривающая учёт слабых одновременных взаимодействий на больших расстояниях. Подроб-ное описание программы приведено в работах [11,12].…”

Section: методика расчётаunclassified

ANGLE DISTRIBUTION OF ATOMS SPUTTERED FROM TEXTURED Mo AND W POLICRYSTALS

Rogov¹,

Martynenko²,

Belova³

et al. 2011

PAST-TF

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Текстура поверхности диагностических зеркал в токамаках влияет на их оптические характеристики. Поэтому исследование раз-ных проявлений поверхностной текстуры актуально. В то же время угловые распределения распылённых атомов важны для расчё-та загрязнения первого зеркала для оптических диагностик за счёт переосаждения продуктов эрозии. В работе исследовано влия-ние текстуры поверхностного слоя поликристаллических мишеней Mo и W на угловые распределения атомов при распылении в малоразмерном планарном DC-магнетроне ионами Ar + с энергией 200-300 эВ. Текстура формировалась при прокатке металличе-ских фольг и в процессе изготовления протяжённых прутков из слитков и контролировалась с помощью рентгеноструктурного анализа. Обнаружена анизотропия углового распределения атомов, распыляемых из фольг: в плоскости, перпендикулярной про-катке, наблюдается максимум при θ = 0 (нормаль к распыляемой поверхности); в плоскости, параллельной направлению прокатки, имеются максимумы при θ = 0 (Mo, W), 57º (Mo) и 60º (W). В случае распыления образцов, изготовленных из прутков, азимуталь-ной анизотропии не обнаружено, однако полярное распределение имеет максимум при θ = 37º (Mo) и 45º (W) в отличие от поли-кристаллов Mo и W с хаотическим распределением зёрен, для которых максимальный выход распыления наблюдается при θ = 0. Компьютерное моделирование, проведённое с учётом вклада кристаллитов, выявленных при рентгеноструктурном анализе, пока-зало хорошее качественное соответствие расчётных и экспериментальных угловых распределений распылённых атомов. Отмечено, что угловое распределение распылённых атомов может быть использовано для определения текстуры поверхности.Ключевые слова: распыление, угловое распределение, поликристаллы, текстура, магнетрон.ANGLE DISTRIBUTION OF ATOMS SPUTTERED FROM TEXTURED Mo AND W POLICRYSTALS. A.V. ROGOV, Yu.V. MARTYNENKO, N.E. BELOVA, V.I. SHULGA. Surface texture of diagnostic mirrors in tokamak s effects on mirrors optical characteristics. Therefore investigation of various texture manife stations is an actual problem. The same time angular distribution of sputtered atoms is important for calculation of first diagnostic mirror contamination due t o erosion products deposition. In the work the effects of W and Mo surface crystalline texture on the angular distribution of sputtered atoms was investigated at sputtering in small size DC-magnetron by 200-300 eV Ar + ions. Crystalline texture was formed under rolling of metal foils and during preparation of metal bars and was controlled by X-ray diffraction analysis. A strong anisotropy of the angular distribution was found for foils: in the planes oriented perpendicularly to the direction of rolling the angular distribution was peaked at the polar angle θ = 0, while in the direction parallel to the rolling the angular distribution has maxima at θ = 0 (Mo, W), 57º (Mo) and 60º (W). For bars, no azimuthal anisotropy was observed but the angular distribution was peaked at θ = 37º (Mo) and θ = 45º (W) in contrast to the case of Mo and W polycrystals with random gr...

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Angular distribution of atoms sputtered from amorphous and polycrystalline targets

Cited by 26 publications

References 65 publications

Angular distribution of atoms during the magnetron sputtering of polycrystalline targets

Angular distribution of atoms during the magnetron sputtering of polycrystalline targets

Relief evolution of HOPG under high-fluence 30keV argon ion irradiation

ANGLE DISTRIBUTION OF ATOMS SPUTTERED FROM TEXTURED Mo AND W POLICRYSTALS

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