1999
DOI: 10.1016/s0022-3115(98)00648-5
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Angular dependence of the sputtering yield of rough beryllium surfaces

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Cited by 61 publications
(44 citation statements)
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“…Figures 3 (a)-(c) compare the angular sputtering yield for two surface roughnesses of three ion-target systems: Helium on Beryllium, Deuterium on Beryllium, and Argon on Tungsten respectively. As observed in other simulations and experiments, the peak of maximum sputtering yield shifts to the right [17], [18], [19]. In Fig.…”
Section: Implementation Of Fractal Surface Roughness In F-tridynsupporting
confidence: 87%
See 1 more Smart Citation
“…Figures 3 (a)-(c) compare the angular sputtering yield for two surface roughnesses of three ion-target systems: Helium on Beryllium, Deuterium on Beryllium, and Argon on Tungsten respectively. As observed in other simulations and experiments, the peak of maximum sputtering yield shifts to the right [17], [18], [19]. In Fig.…”
Section: Implementation Of Fractal Surface Roughness In F-tridynsupporting
confidence: 87%
“…As a component in a multiscale code, F-TRIDYN will be useful for simulation of the atomic timescale effects of energetic ions on a material, such as erosion, implantation, and backscattering, and will act as the boundary between plasma edge and material bulk codes. [17], [18], [19], namely: reduction in yield for some systems at medium angle of incidence and the shift of the maximum sputtering yield to the right.…”
Section: Discussionmentioning
confidence: 99%
“…However, surface roughness is prone to increase the sputtering yield up to a factor of 5. There have been a few approaches to predict the sputtering yields of rough surface: Ruzic suggested considering the surface roughness as having a fractal geometry [7]; Kuestner et.al., assumed that the surface can be represented as aggregates of simple surfaces at tilted angles [8,9]. These approaches yield results in reasonable agreement with experiments, but their intrinsic limitations had prevented further development of the models.…”
Section: Introductionmentioning
confidence: 99%
“…This is because for a rough surface and a given fixed macroscopic incidence angle, on the microscopic level, which is seen by the impinging particles, a broad range of incidence angles occur at the same time. Furthermore, on a rough surface, the sputtering yield is lower than that of a flat surface due to the re-deposition of sputtered products ( Küstner et al, 1999;Loeffler et al, 2009 ). We estimate that the sputtering yields at an 83 °macroscopic angle of incidence, as used in our setup, correspond approximately to the sputtering yields from a flat surface at an ∼60 °angle of incidence ( Küstner et al, 1999 ).…”
Section: Ena Yieldmentioning
confidence: 86%
“…Furthermore, on a rough surface, the sputtering yield is lower than that of a flat surface due to the re-deposition of sputtered products ( Küstner et al, 1999;Loeffler et al, 2009 ). We estimate that the sputtering yields at an 83 °macroscopic angle of incidence, as used in our setup, correspond approximately to the sputtering yields from a flat surface at an ∼60 °angle of incidence ( Küstner et al, 1999 ). Including this correction for the incident angle, our measurements are compatible with the model of Famá et al (2008) , as discussed below, despite the ice temperature of 150 K being outside the parameter range this model was made for ( T < 140 K).…”
Section: Ena Yieldmentioning
confidence: 99%