2016
DOI: 10.1063/1.4948380
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Anderson localization of graphene by helium ion irradiation

Abstract: Irradiation of a single-layer graphene (SLG) with accelerated helium ions (He+) controllably generates defect distributions, which create a charge carrier scattering source within the SLG. We report direct experimental observation of metal-insulator transition in SLG on SiO2/Si substrates induced by Anderson localization. This transition was investigated using scanning capacitance microscopy by monitoring the He+ dose conditions on the SLG. The experimental data show that a defect density of more than ∼1.2% in… Show more

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Cited by 21 publications
(15 citation statements)
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“…One historically prevalent application for ion beam technology is ion implantation for doping and researchers naturally attempted a similar approach for 2D materials by implanting ions of different species in films of graphene to manipulate their electronic properties [20][21][22][23][24]. Other works reported phase changes from semiconducting to quasi-metallic or insulating phases by changing the dose of a focused He + ion beam [25,26]. Researchers have also used ion beams to engineer defects in different TMDs, allowing controlled alteration in electrical, mechanical and optical properties [27][28][29].…”
Section: Introductionmentioning
confidence: 99%
“…One historically prevalent application for ion beam technology is ion implantation for doping and researchers naturally attempted a similar approach for 2D materials by implanting ions of different species in films of graphene to manipulate their electronic properties [20][21][22][23][24]. Other works reported phase changes from semiconducting to quasi-metallic or insulating phases by changing the dose of a focused He + ion beam [25,26]. Researchers have also used ion beams to engineer defects in different TMDs, allowing controlled alteration in electrical, mechanical and optical properties [27][28][29].…”
Section: Introductionmentioning
confidence: 99%
“…8 Therefore, the three concave ∆C profiles, which correspond to the depression of the topography profile in Fig. 1(c), indicate the metal-Anderson insulator transition.…”
mentioning
confidence: 87%
“…7 Moreover, we exhibited the Anderson localization of H + -irradiated single-layer graphene (SLG). 8 In this study, we ascertain the spatial dependence of Anderson localization of SLG.…”
mentioning
confidence: 99%
“…One of the most useful features of strongly correlated oxides is that the ground state properties can be modified easily by various means, including implantation of or irradiation with light, inert ions like He and Ar. [193][194][195][196][197] A key advantage of this approach is the ability to focus a beam of light ions down to a beam diameter on the order of a few nanometers, localizing the effect the light ions have on the correlated material. 196,197 One application is modifying the oxygen stoichiometry within a narrow region of a few nanometers.…”
Section: B Coupling Magnetic Devicesmentioning
confidence: 99%