2018
DOI: 10.1002/adts.201700035
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Analytical Modeling of Organic–Inorganic CH3NH3PbI3 Perovskite Resistive Switching and its Application for Neuromorphic Recognition

Abstract: This paper presents an analytical model of resistive switching in organic-inorganic CH 3 NH 3 PbI 3 perovskite. It is interpreted that the resistive switching phenomenon is due to the formation/rupture of iodine vacancy-based conductive filament (CF) propagating in both vertical and lateral directions. Set and reset processes are explained in the model by the evolution of the CF length and radius driven by electrical and thermal forces. The model-based simulation results can describe the experimental results, … Show more

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Cited by 36 publications
(38 citation statements)
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“…The RRAM device used in current work is based on a traditional metal–insulator–metal configuration where a CH 3 NH 3 PbI 3 switching layer was sandwiched between an SnO 2 :F (FTO) bottom electrode (BE) and Al top electrode (TE), as illustrated in Figure a. Figure b shows the X‐ray diffraction (XRD) pattern of the CH 3 NH 3 PbI 3 thin film and confirmed its typical tetragonal perovskite structure . Figure c presents cross‐sectional scanning electron microscope (SEM) and atomic force microscope (AFM) images, which show that the thickness and surface roughness of the CH 3 NH 3 PbI 3 film were approximately 500 and 40 nm, respectively.…”
Section: Resultsmentioning
confidence: 84%
“…The RRAM device used in current work is based on a traditional metal–insulator–metal configuration where a CH 3 NH 3 PbI 3 switching layer was sandwiched between an SnO 2 :F (FTO) bottom electrode (BE) and Al top electrode (TE), as illustrated in Figure a. Figure b shows the X‐ray diffraction (XRD) pattern of the CH 3 NH 3 PbI 3 thin film and confirmed its typical tetragonal perovskite structure . Figure c presents cross‐sectional scanning electron microscope (SEM) and atomic force microscope (AFM) images, which show that the thickness and surface roughness of the CH 3 NH 3 PbI 3 film were approximately 500 and 40 nm, respectively.…”
Section: Resultsmentioning
confidence: 84%
“…The low V SET was found preferable for improving the RS variability in the above studies. Moreover, the LEF enhancement effect has been demonstrated as a feasible method to improve RS performance in some previous publications …”
Section: Resultsmentioning
confidence: 99%
“…Analytical models of the OHP‐based memristors are essential tools to predict their memristive performance and optimize the memristive characteristics. Based on the V I migration mechanism, an analytical model for MAPbI 3 ‐based memristor was proposed . In correspondence of RESET process, V I migration can be activated by two processes: the Fick diffusion process and V I drift process.…”
Section: Memristors Based On Ohpsmentioning
confidence: 99%
“…B, The experimental/calculated I ‐ V curves of the memistor. C, The calculated evolution of applied voltage, local temperature, and CF parameters with time during RESET/SET process…”
Section: Memristors Based On Ohpsmentioning
confidence: 99%
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