Analytical model for the drain and gate currents in silicon nanowire and nanosheet MOS transistors valid between 300 and 500 K
Antonio Cerdeira,
Magali Estrada,
Michelly de Souza
et al.
Abstract:This work presents an analytical model for the drain and gate currents of silicon nanowire and nanosheet MOS transistors valid in all operating regions in the temperature range from 300 to 500 K. Analytical models for the tunneling components as well as for the reversely biased drain‐to‐channel PN junction are presented. Also, the models accounting for the necessary modifications in the silicon physical quantities for high‐temperature operation, such as the maximum carrier mobility, the bandgap, and the intrin… Show more
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