Analytical description of SIMS depth resolution with different ions dose irradiation

Mahdi, Dunia K.; Chaabi, A.

doi:10.1063/1.4975448

Cited by 2 publications

(1 citation statement)

References 13 publications

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“…The SEM micrograph in figure 5 SIMS depth profile measurement is a very important tool for the depth analysis of thin films. Obtaining information on the composition of the different layers with depth below the initial surface is possible through this technique [33]. 1.…”

Section: In-situ Temperature-dependent Sheet Resistancementioning

confidence: 99%

In-situ temperature-dependent sheet resistance study of Cu films in oxygen ambient for heterogeneous integrations

Chavan,

Kim,

Choi

et al. 2024

Nanotechnology

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Controlling and preventing Cu oxidation is crucial for improving the performance and reliability of Cu-Cu bonding. Ni-B films were selectively deposited on Cu films to block the Cu oxidation. The resistivity changes of the Cu films in N2 and O2 ambient were measured by using a four-point probe in the in-situ temperature-dependent resistance measurements at the temperature from room temperature to 400°C. The resistivity changes of the 100nm-thick Cu films without Ni-B increased rapidly at a higher temperature (284°C) in the O2 ambiance. The change of resistivity-increase of 100nm-thick Cu with ~50 nm-thick Ni-B (top) film was lower than the Cu films without Ni-B films due to the blocking diffusion of O2 atoms by the Ni-B films. The resistivity-change and oxidation barrier properties were studied using SEM, FIB, TEM, EDX, and SIMS tools. The proposed article will be helpful for the upcoming advancement in Cu-Cu bonding using selected-area deposition.

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Section: In-situ Temperature-dependent Sheet Resistancementioning

confidence: 99%

In-situ temperature-dependent sheet resistance study of Cu films in oxygen ambient for heterogeneous integrations

Chavan,

Kim,

Choi

et al. 2024

Nanotechnology

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LIBS Analysis of Optical Surfaces and Thin Films

Gerhard¹,

Hermann

2023

Laser Induced Breakdown Spectroscopy (LIBS)

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Elemental analyses of thin films and optical surfaces with complex compositions are challenging as the standard analytical techniques based on measurement calibration are difficult to apply. In this chapter, we show that calibration-free laser-induced breakdown spectroscopy presents a powerful solution, enabling rapid quantitative analyses of multi-elemental thin films or tiny surface volumes of optical materials with high analytical performances. Examples are given for classically polished optical glass and a nickel-chromium-molybdenum alloy film of 150 nm thickness. Thus, broadband spectra, recorded under experimental conditions that enable simple and accurate modeling of plasma emission, are processed via a calibration-free approach based on the calculation of the spectral radiance of a plasma in local thermodynamic equilibrium to deduce the elemental composition. The validation via energy-dispersive X-ray spectroscopy, inductively coupled plasma atomic emission spectroscopy, and Rutherford backscattering spectrometry illustrates that calibration-free LIBS is not only a promising tool, but already a reliable analytical technique.

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Analytical description of SIMS depth resolution with different ions dose irradiation

Cited by 2 publications

References 13 publications

In-situ temperature-dependent sheet resistance study of Cu films in oxygen ambient for heterogeneous integrations

In-situ temperature-dependent sheet resistance study of Cu films in oxygen ambient for heterogeneous integrations

LIBS Analysis of Optical Surfaces and Thin Films

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