Analytical characterization of thin carbon films

Ohr, R.; Schug, C.; Wahl, Michael; Wienss, A.; Hilgers, H.; Mahrholz, J.; Willich, P.; Jung, Th.

doi:10.1007/s00216-002-1667-2

Cited by 8 publications

(2 citation statements)

References 13 publications

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“…Other groups have used similar AFM nanomachining techniques to determine the thickness of dendrimer monolayers (27) and spin-cast polymer thin films (28) and measure the wear resistance of thin carbon films (29), nanopatterning (30), and the plowing friction of thin polymer films (31). This is, to our knowledge, the first use for environmental samples.…”

Section: Methodsmentioning

confidence: 99%

Quantifying the Dimensions of Nanoscale Organic Surface Layers in Natural Waters

Gibson

Turner

Roberts

et al. 2007

Environ. Sci. Technol.

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Nanoscale surface films are known to develop on surfaces exposed to natural waters and have potential impacts on many environmental processes. A new method using atomic force microscopy is presented which physically removes the developed film in a defined area and then quantifies the difference in height between the film and the area where the film has been removed. The difference gives the absolute thickness of the surface film, which has not previously been measured. Suwannee River humic acid was exposed to substrates, and the surface film thickness as a function of pH and exposure time was measured. Discrete and very small colloids in the range 1-5 nm were observed as expected, and these sat on a coherent surface film, notthe original mica substrate. Low pH values of 2 gave rise to relatively thick surface films of about3 nm, although these films were not continuous at higher pH values. At pH 4.8, the film thickness increased with exposure time up to about 5 h and did not subsequently increase. The maximum film thickness measured was about 1 nm at that pH. The method is applicable to the measurement of many environmental surfaces, although resolution will depend on the substrate and film roughness.

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Section: Methodsmentioning

confidence: 99%

Quantifying the Dimensions of Nanoscale Organic Surface Layers in Natural Waters

Gibson

Turner

Roberts

et al. 2007

Environ. Sci. Technol.

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“…It shows the possibility of chemical information as well as temperature and layer thickness determination [14]. Combined analysis of Raman peak position and intensity indicates a graphic structure for film thickness of less than 10 nm [15].…”

Section: Introductionmentioning

confidence: 88%

Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous silicon

Zeng¹,

Lu²,

Shen³

et al. 2004

Nanotechnology

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Raman spectroscopy was used to investigate excimer laser annealing and thickness determination of amorphous silicon (a-Si) layers which are less than 20 nm thick. The a-Si layers were produced on silicon (Si) substrates using Si + ion implantation with an energy of 10 keV and a dose of 1 × 10 15 cm −2. Excimer laser annealing was applied to re-crystallize the a-Si layers. The dependence of re-crystallization on laser fluence was investigated using Raman spectroscopy. A threshold laser fluence of 0.4 J cm −2 was required to re-crystallize the a-Si layers. In Raman spectroscopy, the Raman intensity shows a periodical variation with a period of 90 • as a function of the angle between the Si orientation and the laser polarization. Based on this phenomenon, a method to determine nanoscale a-Si film thickness was proposed in two ways. One way was carried out without sample rotation to determine the a-Si thickness provided that the reference c-Si and a-Si/c-Si samples are in the same crystal orientation. The other way was carried out with sample rotation to determine the a-Si thickness without knowing the crystal orientation beforehand.

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Characterisation of amorphous carbon coatings for magnetic storage devices via AFM‐Nanoscratching devices. AFM‐Nanoscratching an amorphen Kohlenstoffschichten für die Speichertechnologie

Jacoby¹,

Wienss²,

Gradowski³

et al. 2003

Vak Forsch Prax

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The mechanical properties of ultra‐thin amorphous carbon films used as protective coatings for magnetic storage devices were investigated by means of atomic force microscopy (AFM). Diamond‐tipped cantilevers were used in order to generate scratches with residual scratch depths of only a few Angstroms and even below. The presented method simulates mechanical strains at the head‐disk interface. A driftcompensating image subtracting technique allows the visualisation of these ultra‐shallow scratches and enables the mechanical characterisation of only few Nanometer films widely independent from the hardness of the substrate. The scratch resistance as it is defined here correlates well with the mass density and the sp3 content of the investigated films.

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Analytical characterization of thin carbon films

Cited by 8 publications

References 13 publications

Quantifying the Dimensions of Nanoscale Organic Surface Layers in Natural Waters

Quantifying the Dimensions of Nanoscale Organic Surface Layers in Natural Waters

Raman spectroscopy investigation on excimer laser annealing and thickness determination of nanoscale amorphous silicon

Characterisation of amorphous carbon coatings for magnetic storage devices via AFM‐Nanoscratching devices. AFM‐Nanoscratching an amorphen Kohlenstoffschichten für die Speichertechnologie

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