Analytical and functional characterization of ultrathin carbon coatings for future magnetic storage devices

Ohr, R.; Jacoby, B.; Gradowski, M. von; Schug, C.; Hilgers, H.

doi:10.1016/s0257-8972(03)00555-3

Cited by 12 publications

(12 citation statements)

References 9 publications

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“…Indeed a ϳ1 nm thick HCA ta-C film has Young's modulus of ϳ50 GPa. 16,18,20 This trend can be understood if we consider the cross sectional structure of ta-C films. 5,8 The top layer is low density and more graphitic.…”

mentioning

confidence: 94%

“…The thickness is between 0.9 and 20 nm, as determined by x-ray reflectivity ͑XRR͒. 16 The Si substrate cleaning and predeposition preparation are discussed in detail elsewhere. 5,6,8,[16][17][18][19][20] The Young's modulus is derived by a combination of surface Brillouin scattering and laser induced surface acoustic waves.…”

mentioning

confidence: 99%

“…16 The Si substrate cleaning and predeposition preparation are discussed in detail elsewhere. 5,6,8,[16][17][18][19][20] The Young's modulus is derived by a combination of surface Brillouin scattering and laser induced surface acoustic waves. [17][18][19] The evolution of the structure with decreasing thickness is further investigated by Raman spectroscopy.…”

mentioning

confidence: 99%

“…20 The thickest film measured here ͑20 nm͒ has a Young's modulus of ϳ400 GPa, and density of ϳ2.6 g / cm 3 . 5,16,20 This corresponds to a sp 3 content of ϳ60%. A structural change happens below 10 nm: the sp 3 content, density, and Young's modulus decrease.…”

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confidence: 99%

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Thermal conductivity of ultrathin tetrahedral amorphous carbon films

Balandin

Shamsa

Liu

et al. 2008

Applied Physics Letters

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We investigate the thermal conductivity of ultrathin tetrahedral amorphous carbon (ta-C) films on silicon, down to subnanometer thickness. For films with an initial sp3 content of 60%, the thermal conductivity reduces from 1.42to0.09W∕mK near room temperature as the thickness decreases from 18.5to∼1nm. The variation in ta-C film thickness is accompanied by changes in Young’s modulus, density, and sp3 content. The thermal resistance of the finite-thickness interface layer, which forms between ta-C and silicon, is ∼10−8m2K∕W near room temperature, thus producing a noticeable effect on thermal transport in ultrathin ta-C films.

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confidence: 94%

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confidence: 99%

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confidence: 99%

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confidence: 99%

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Thermal conductivity of ultrathin tetrahedral amorphous carbon films

Balandin

Shamsa

Liu

et al. 2008

Applied Physics Letters

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“…Carbon nitride thin films can be deposited by a variety of deposition techniques, namely sputtering, 15 plasma enhanced chemical vapor deposition, 16,17 filtered cathodic vacuum arc ͑FVCA͒, 18,19 electron cyclotron wave resonance ͑ECWR͒, 20 mass selected ion beam deposition, 21 and integrated distributed electron cyclotron resonance. 22 Among the deposition techniques, pulsed laser deposition ͑PLD͒ ͑Refs.…”

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confidence: 99%

Electronic state modification in laser deposited amorphous carbon films by the inclusion of nitrogen

Miyajima

Adamopoulos

Henley

et al. 2008

Journal of Applied Physics

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In this study, we investigate the effect of the inclusion of nitrogen in amorphous carbon thin films deposited by pulsed laser deposition, which results in stress induced modifications to the band structure and the concomitant changes to the electronic transport properties. The microstructural changes due to nitrogen incorporation were examined using electron energy-loss spectroscopy and Raman scattering. The band structure was investigated using spectroscopic ellipsometry data in the range of 1.5-5 eV, which was fitted to the Tauc Lorentz model parametrization and optical transmittance measurements. The dielectric constant evaluated using optical techniques was compared to that obtained with electrical measurements, assuming a Poole-Frenkel type conduction process based on the best fits to data. The electrical conduction mechanism is discussed for both low and high electric fields, in the context of the shape of the band density of states. By relating a wide range of measurement techniques, a detailed relationship between the microstructure, and the optical and the electrical structures of a-CN x films is obtained. From these measurements, it was found that, primarily, the change in density of the film, with increasing nitrogen pressure, affects the band structure of the amorphous carbon nitride. This is due to the fact that the density affects the stress in the film, which also impacts the localized states in the band gap. These results are supported by density of states measurements using scanning tunneling spectroscopy.

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Overcoat Materials for Magnetic Recording Media

Piramanayagam

Chong

2011

Developments in Data Storage

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Analytical and functional characterization of ultrathin carbon coatings for future magnetic storage devices

Cited by 12 publications

References 9 publications

Thermal conductivity of ultrathin tetrahedral amorphous carbon films

Thermal conductivity of ultrathin tetrahedral amorphous carbon films

Electronic state modification in laser deposited amorphous carbon films by the inclusion of nitrogen

Overcoat Materials for Magnetic Recording Media

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