2022
DOI: 10.1049/pel2.12280
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Analysis on characteristic of 3.3‐kV full SiC device and railway traction converter design

Abstract: With the rapid development of wide‐band gap semiconductor chip and package technologies, the voltage class of commercial silicon carbide (SiC) device is gradually improved. This paper concentrates on the latest 3.3‐kV full SiC‐based metal oxide semiconductor field‐effect transistor (MOSFET) device and its application in railway traction. First, compared with the Si‐based insulated‐gate bipolar transistor (IGBT), the SiC‐based MOSFET shows lower switching loss but weaker short‐circuit capacity. Second, in the r… Show more

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Cited by 3 publications
(1 citation statement)
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“…Therefore, it is necessary to design a structure that suppresses the electric field at the gate oxide to ensure the safety and commercialization of SiC trench MOSFETs. [16][17][18][19][20][21][22][23][24][25][26][27][28] Bottom protection p-well (BPW) and double-trench MOSFETs are representative structures for suppressing the electric field crowded on the gate oxide. 29,30) However, BPW has considerable disadvantages depending on the thickness of the spacer to prevent ion implantation on the trench sidewall, such as severe process dispersion and high on-resistance.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, it is necessary to design a structure that suppresses the electric field at the gate oxide to ensure the safety and commercialization of SiC trench MOSFETs. [16][17][18][19][20][21][22][23][24][25][26][27][28] Bottom protection p-well (BPW) and double-trench MOSFETs are representative structures for suppressing the electric field crowded on the gate oxide. 29,30) However, BPW has considerable disadvantages depending on the thickness of the spacer to prevent ion implantation on the trench sidewall, such as severe process dispersion and high on-resistance.…”
Section: Introductionmentioning
confidence: 99%