Analysis of the Shape of Cross Sections Developed under Shave-off Condition Sputtering

Kang, Sooncheol; Fukushima, Miku; Asakura, Hiroyuki; Habib, Ahsan; Kim, Yun; Tomiyasu, Bunbunoshin; Owari, Masanori

doi:10.1384/jsa.24.164

Cited by 3 publications

(2 citation statements)

References 3 publications

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“…The cross-sectional SEM images into a graph using a program made in-house based on the Visual Basic software for comparison. In our previous report [4], the bottom part of the cross-sectional shape was affected by the primary ion beam and other factors. Therefore, only part of the 10 µm depth was converted from the sample surface (0 µm) to a graph of the cross-sectional shape.…”

Section: Resultsmentioning

confidence: 79%

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Influence of the Shave-off Scan Speed on the Cross-Sectional Shape

Kang

Kim

Tomiyasu

et al. 2018

e-J. Surf. Sci. Nanotech.

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The shave-off scan method is a unique secondary ion mass spectrometry (SIMS) section processing technique using a gallium focused ion beam (Ga FIB). The sample had a distinctive cross-sectional shape after shave-off scanning, and the slope of the cross section related to the incident angle of the beam that affects sputtering yield. This study investigates sputtering yield as a function of shave-off scan speeds based on cross-sectional shapes examined using a scanning electron microscope (SEM). To conduct a more detailed comparison of the cross sections, the SEM images were converted to an X, Y coordinate system using an in-house program. The sputtering yield decreased as scan speed decreased and incident angle increased. This result opposed the results obtained using conventional raster scanning, and beam profiles could be predicted from the cross-sectional shapes.

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Section: Resultsmentioning

confidence: 79%

“…The sample was then rotated 90 • , and the bottom part was cut to adjust sample thickness (30 µm, Z-axis). For a detail explanation of this process was written in our previous paper [4].…”

Section: A Sample Preparationmentioning

confidence: 99%

Influence of the Shave-off Scan Speed on the Cross-Sectional Shape

Kang

Kim

Tomiyasu

et al. 2018

e-J. Surf. Sci. Nanotech.

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Mass Spectrometry Imaging Techniques: Non-Ambient and Ambient Ionization Approaches

Hu,

Habib,

Xiong

et al. 2024

Critical Reviews in Analytical Chemistry

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Simulation of Secondary Ion Position on the Detector for Three-dimensional Shave-off Method

Kang

Kishi

Matsumura

et al. 2020

e-J. Surf. Sci. Nanotechnol.

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The concept of three-dimensional (3D) shave-off secondary ion mass spectrometry (SIMS) is that enables to obtain the depth information of the sample simultaneously with the mass information using the vertical axis of a two-dimensional position-sensitive detector in the mass analyzer. In this study, we simulated the trajectory of secondary ions sputtered from a virtual sample in the 3D shave-off SIMS system and investigated the magnification ratio of the ions. The simulation results showed that we could distinguish the depth position of the secondary ions sputtered from a sample by the detected position in our concept of 3D shave-off SIMS.

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Analysis of the Shape of Cross Sections Developed under Shave-off Condition Sputtering

Cited by 3 publications

References 3 publications

Influence of the Shave-off Scan Speed on the Cross-Sectional Shape

Influence of the Shave-off Scan Speed on the Cross-Sectional Shape

Mass Spectrometry Imaging Techniques: Non-Ambient and Ambient Ionization Approaches

Simulation of Secondary Ion Position on the Detector for Three-dimensional Shave-off Method

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