Analysis of shallow depth profiles of titanium nitride and N-implanted titanium by GD-OES: the ‘hydrogen effect’ after the discharge startup and a correction thereof

Abstract

A method is presented for the correction of the GD-OES depth profiles of N-implanted titanium, perturbed by the hydrogen effect on the discharge startup.

Tribomechanical Properties of a Carbon-Based Nanolayer Prepared by Nitrogen Ion Beam Assisted Deposition for Finger Joint Replacements

“…The -Ti(+N) structural phase marks the hexagonal structure derived from the -Ti phase, but with enlarged lattice parameters due to incorporation of nitrogen in interstitial sites of the Ti matrix [31]. The uneven dispersion of implanted nitrogen with a near-Gaussian distribution [35] induces a TiN and Ti(+N) mixture formation in the implanted region [31].…”

Analysis of Hydrogen in Inorganic Materials and Coatings: A Critical Review

“…In GDOES and GDMS, a number of processes involving hydrogen occur in the glow discharge plasma that are far from being completely described and understood. However, they significantly affect the measured intensities [43][44][45][46][47]. Likewise, in LIBS, analytical interpretation of the spectra is a very complex task, especially in the calibration-free approach.…”

“…Such effects were first described in chromium [43] and have been extensively studied in both GDOES [44,45] and GDMS [46]. Various correction schemes have been proposed to handle such situations, e.g., in the analysis of N-implanted Ti [47]. Accurate quantitative analysis of hydrogen by GDOES usually requires the calibration and quantification to be matrix-matched and supported by suitable reference materials.…”

Investigation of matrix independent calibration of oxygen in glow discharge optical emission spectrometry

“…Weiss and Vlcak reported recently about the influence of these contaminations on the analysis of TiN and N-implanted Ti and proposed a correction algorithm. 8 The higher uncertainty of the oxygen concentration and sputtering rate applies also to other calibration samples. Sample CE 650 from Swedish Institute for Metals Research with 34 m% oxygen is extremely hard and therefore has a very low sputtering rate, which is difficult to measure with high accuracy.…”