Analysis of resin flow during nano-imprinting lithographic process

Kang, J.H.; Kim, S.M.; Woo, Young Seok; Lee, W.I.

doi:10.1016/j.cap.2007.04.058

Cited by 5 publications

(4 citation statements)

References 10 publications

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“…Regardless of mold rigidity and deployment of resist materials, the resist flow driven by contact pressure during the imprinting stage plays a critical role in nanoimprinting lithography. A lot of research works have been reported before [22][23][24][25][26][27][28] but most of them were focusing on rigid molds as depicted in figures 1(a)-(c). However, the schemes depicted in figures 1(d)-(i) are inherently favorable for nanoimprinting since they provide the contact angle needed for resist flow, avoid air bubble trapping, and have a better chance of conformal mold/substrate contact.…”

Section: Introductionmentioning

confidence: 99%

Droplet spreading nanoimprinting method for micro-/nano-fabrication

Tu¹,

Lee²

2020

J. Micromech. Microeng.

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This paper proposes an innovative nanoimprinting method that features imprinting a single droplet of resist and spreading it from center to edge to fully cover a full wafer substrate. Important advantages of this type of nanoimprinting include avoiding air bubble trapping, forming conformal mold/substrate contact, minimizing residual layer thickness, and saving the amount of resist being used. It also makes the demolding process much easier and more successful. To realize this nanoimprinting method, an imprinting tool is designed, constructed, and experimentally tested, and three key components are developed. First of all, a soft mold is integrated into a dovetailed metal ring so that it can be fixed at its edge and deformed by external force. Secondly, two independent loading mechanism are installed so that a soft mold can be initially deformed to form a point contact with a substrate and then followed by imprinting process. Finally, an elastomer cushion pad with a pre-designed convex surface profile is used to convert the loading force into a specific distributed contact pressure which can drive the resist flow. Nanoimprinting experiments have been carried out for pattering micro-scaled and nano-scaled structures on 4″ glass wafers. Excellent imprinting results are observed. The potentials and future perspectives of the proposed nanoimprint system will be addressed.

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Section: Introductionmentioning

confidence: 99%

Droplet spreading nanoimprinting method for micro-/nano-fabrication

Tu¹,

Lee²

2020

J. Micromech. Microeng.

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“…Lee et al investigated various polymer filling behaviors including the numerical methods according to the slip boundary condition, dynamic contact angle, pressure and temperature. It was shown that the polymer filling shape could be varied according to the pressure, temperature, and stamp geometry [ 7 , 8 ]. Bonning et al proposed a new simulation technique with a contact mechanical-based approach for thermal NIL.…”

Section: Introductionmentioning

confidence: 99%

A modified squeeze equation for predicting the filling ratio of nanoimprint lithography

Ryu

Lee

et al. 2017

Nano Convergence

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A numerical method using the modified squeeze model is proposed in this paper in order to overcome the limitation of the established squeeze equation and obtain filling ratios for nanoimprint lithography (NIL). Because the imprinting velocity is overestimated when the ratio of indenter width to polymer thickness is close to unity, the modified equation is critical. For verification, the numerical results are compared with the experimental data according to the various stamp geometries and pressure variation rates, for which a maximum difference of 10% is indicated. Based on these results, additional studies are conducted using the modified squeeze equation in order to obtain filling ratios according to the polymer thickness and temperature. The filling rates are enhanced through the increases in the temperature and the polymer thickness. The results demonstrate that the modified squeeze equation can be used to obtain and predict the filling ratio of sub-nanoscale NIL fabrication. It is expected that this study will assist in optimizing the experimental conditions and approaches for roll-to-roll NIL and step-and-flash NIL.

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“…Originally patented by Stephen Chou [1], contributions to NIL have been made through experiment and numerical analysis by others since [2][3][4][5][6][7][8][9][10][11][12].…”

Section: Introductionmentioning

confidence: 99%

Simulation of mold deformation and pattern interaction in nanoimprint lithography

Cleveland

Sun

2014

MRS Proc.

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As an emerging manufacturing technique, nanoimprint lithography (NIL) can fabricate micro and nanoscale features of microfluidic devices at very high accuracy and reliability. In high-temperature TNIL process, a polymer melt such as polymethyl-methacrylate (PMMA) is heated beyond the melting temperature so that it behaves predominantly as a fluid during the imprint process. The process parameters such as pressure, temperature, and material properties play critical roles in the NIL process. In this work, the process of thermal nanoimprint lithography (TNIL) is studied computationally with emphasis on the effect of soft-mold deformation on polymer melt flow and finished result by-way-of fluid-structure interaction (FSI) technology. Process is assumed isothermal at 180 °C. Applications of this modeling technique range from micro-and nano-patterns used in micro-channels for biomedical devices to other applications such as biological/particle sensors or super-hydrophobic surfaces. The simulation result is compared to experimental results, and traits observed in TNIL done with soft mold are supported and explained through numerical results.

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Analysis of resin flow during nano-imprinting lithographic process

Cited by 5 publications

References 10 publications

Droplet spreading nanoimprinting method for micro-/nano-fabrication

Droplet spreading nanoimprinting method for micro-/nano-fabrication

A modified squeeze equation for predicting the filling ratio of nanoimprint lithography

Simulation of mold deformation and pattern interaction in nanoimprint lithography

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