9th International Seminar on Power Semiconductors (ISPS 2008) 2008
DOI: 10.1049/ic:20080194
|View full text |Cite
|
Sign up to set email alerts
|

Analysis of power devices breakdown behaviour by ion beam and electron beam induced charge microscopy

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2008
2008
2017
2017

Publication Types

Select...
3
1

Relationship

1
3

Authors

Journals

citations
Cited by 4 publications
(2 citation statements)
references
References 11 publications
0
2
0
Order By: Relevance
“…Highly sensitive quantitative characterizations are possible in this region equally described by Donolato (1977) for static EBIC measurements. By means of this technique premature breakdown locations can be found within steady-state DUT as illustrated in Figure 5 ( Siemieniec et al 2008).…”
Section: Quantitative Determination Of Electric Field Strengths Withimentioning
confidence: 99%
“…Highly sensitive quantitative characterizations are possible in this region equally described by Donolato (1977) for static EBIC measurements. By means of this technique premature breakdown locations can be found within steady-state DUT as illustrated in Figure 5 ( Siemieniec et al 2008).…”
Section: Quantitative Determination Of Electric Field Strengths Withimentioning
confidence: 99%
“…Considering linear Electrical field distributions within a statically biased power diode with a guard ring in dependence on applied reverse bias voltages. Detection of premature breakdown locations in an edge termination structure of a MOSFET device by EBIC [11]. relationship between EBIC amplitude and electric field, the acquired maps can be correlated to E-field strengths.…”
Section: Determination Of Electric Field Strengths By Spectral Ebmentioning
confidence: 99%