“…For instance, an equivalent fluence of 10 16 cm À 2 1 MeV electrons, which corresponds to a typical space condition, introduces a total of 10 16 cm À 3 defects in GaAs (1) while the emitter and base of a cell are doped at a level of several 10 17 cm À 3 . Systematic studies, combining measurements of I-V characteristics in dark and under illumination, electroluminescence, time resolved photoluminescence (TRPL) and deep level transient spectroscopy (DLTS) performed on single GaAs and GaInP junctions, have allowed us to identify, characterize and measure the concentrations and the introduction rates (for 1 MeV electrons only) of the native and irradiation induced defects acting as non-radiative recombination centers in these two materials [1][2][3][4][5][6][7][8].…”