Randomization of the trap state of defects present at the gate Si-SiO2 interface of MOSFET is responsible for the low-frequency noise phenomena such as Random Telegraph Signal (RTS), burst, and 1/f noise. In a previous work, theoretical modelling and analysis of the RTS noise in MOS transistor was presented and it was shown that this 1/f noise can be reduced by decreasing the duty cycle (fD) of switched biasing signal. In this paper, an extended analysis of this 1/f noise reduction model is presented and it is shown that the RTS noise reduction is accompanied with shift in the corner frequency (fc) of the 1/f noise and the value of shift is a function of continuous ON time (Ton) of the device. This 1/f noise reduction is also experimentally demonstrated in this paper using a circuit configuration with multiple identical transistor stages which produces a continuous output instead of a discrete signal. The circuit is implemented in 180 nm standard CMOS technology, from UMC. According to the measurement results, the proposed technique reduces the 1/f noise by approximately 5.9 dB at fs of 1 KHz for 2 stage, which is extended up to 16 dB at fs of 5 MHz for 6 stage configuration. arXiv:1704.00876v1 [cond-mat.other]