The temperature-dependence of the extra lattice thermal resistivity of a doped sample due to the presence of electrons has been studied at low temperatures for the first time by analysing the extra lattice thermal resistivity due to electrons of five samples of phosphorus-doped Ge having different carrier concentrations in the range 1.2X 1023 --1.1 x 10 za m -3 in the temperature range 1--5 K. The variation of the extra lattice thermal resistivity of a doped sample due to electrons with the parameters ~/* (the reduced Fermi energy), m* (the density of states effective mass), E D (the deformation potential constant) and n (the carrier concentration) which are responsible for the electron-phonon scattering relaxation rate has also been analysed for the first time in the present study. A distinction has been made between non-peripheral and peripheral phonons in the present analysis. An analytical expression is reported for calculation of an approximate value of the extra lattice thermal resistivity of a doped sample due to the presence of electrons at low temperatures.In a doped semiconductor, the presence of electrons means an extra scatterer to phonons, and the scattering of phonons may be due either to the conductionstate electrons [1 ] or to the bound-state electrons [24], which depends mainly on the position of the Fermi energy and the concentration of electrons. For low concentrations, the impure atoms may be regarded as independent scatterers of phonons, and phonons are scattered mainly due to virtual transitions of electrons between the singlet state and the first excited triplet state, and the lattice thermal resistivity of the doped sample is mainly due to bound-state electrons. For the higher concentrations, the impurity levels overlap with the conduction band and only a few free electrons are available. As a result, the lattice thermal resistivity of a doped sample having a higher carrier concentration is mainly due to the conduction-state electrons. Several workers [5][6][7] have studied the lattice thermal conductivity of doped semiconductors and it is well established that, for a doped sample having a donor electron concentration larger than 102a m -a, the donor levels merge with the conduction band and the scattering of phonons by the conduction-state electrons is the most relevant scattering mechanism, while the expression reported by Ziman [1 ] for the electron-phonon scattering relaxation rate gives a very good response to the experimental data [8] of a doped semiconductor having a carrier concentration larger than I0 z3 m -z, at low temperatures.