2018 IEEE Electron Devices Kolkata Conference (EDKCON) 2018
DOI: 10.1109/edkcon.2018.8770503
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Analysis of Different Gate Dielectric Materials in Carbon Nanotube Field Effect Transistor (CNFET) Using Optimization Technique

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Cited by 4 publications
(5 citation statements)
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“…In our previous work, it was demonstrated that La2O3 is the best gate dielectric material followed by HfO2 and ZrO2 [25,26]. So, we used La2O3 (εr =30) as a dielectric layer in CNFET.…”
Section: Resultsmentioning
confidence: 99%
“…In our previous work, it was demonstrated that La2O3 is the best gate dielectric material followed by HfO2 and ZrO2 [25,26]. So, we used La2O3 (εr =30) as a dielectric layer in CNFET.…”
Section: Resultsmentioning
confidence: 99%
“…This method is not suitable to be used because CNTFETs involve numerous parameters that can affect their performance, such as channel length, channel width, and gate voltage. Similar to the method in [13], although it can produce the highest current ratio, this method only focus on one parameter which is the chirality and not considering other parameters. There are also other method that do not significantly change the design parameter of the CNTFET during optimization process which is by using a chemical solution.…”
Section: Significant Of Taguchi Methods Applicationmentioning
confidence: 99%
“…This improves the performance of current ratio of the CNTFET. Another method to CNT chirality 200000 (26,0) chirality Optimization of oxide thickness [25] Oxide thickness 940000 1 nm tox Optimization of CNT chirality [13] CNT chirality 70406000 (10,0) chirality Optimization using post sonification treatment [13] SWCNTs network in the channel 1339397 Using a chemical solution Optimization using different fabricating method [27] Growth of CNT channel 452000 Arc Discharge method produce highest current ratio optimize the performance of CNTFET is by using different growth method [27]. The study shows that Arc method produce highest current ratio.…”
Section: Significant Of Taguchi Methods Applicationmentioning
confidence: 99%
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