Analysis of a plasma-assisted reactive evaporation process for preparation of ZnO thin films: Modeling and experimentation

Coarse‐grained approach to amorphous and anisotropic materials in kinetic Monte Carlo thin‐film growth simulations: A case study of TiO2and ZnO by plasma‐enhanced chemical vapor deposition

“…Depending on the scale and nature of the features to be studied, the simulations usually range from those based on molecular dynamics (MD), [1,2] kinetic Monte Carlo (KMC), [3,4] or hybrid methods [5][6][7][8] to continuum methods. [9][10][11][12] There is a wide range of technological applications for which the growth of thin films in multilayer systems (or even in more complex nanostructures) is a fundamental part. In many cases, the systems studied cover scales that are too large to be efficiently simulated by microscopic methods (e.g., MD and atomistic KMC), while at the same time show morphological characteristics that are difficult to simulate using continuous methods.…”

Impact of Deposition Rate on the Structural, Optical, and Electrical Properties of Zinc Oxide (ZnO) Thin Films Prepared by Solar Spray Pyrolysis Method

“…All these properties make it the most important transparent conducting oxides [6] (TCO). Several deposition techniques have been widely used to produce TCO films, namely, RF magnetron sputtering [7], molecular beam epitaxy (MBE) [5], reactive thermal evaporation [8], pulsed laser deposition (PLD) [9], chemical vapour deposition [10], electrochemical deposition and spray pyrolysis technique (SPT) [11]. Among these methods, spray pyrolysis has many advantages to allow it to be the most appropriate technique for producing thin films such as simpler and inexpensive one and taking a hand to obtain films with the efficient properties for optoelectronic applications.…”