2018
DOI: 10.1109/tvlsi.2017.2773481
|View full text |Cite
|
Sign up to set email alerts
|

Analog Layout Retargeting With Process-Variation-Aware Hybrid OPC

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2022
2022
2023
2023

Publication Types

Select...
1
1

Relationship

0
2

Authors

Journals

citations
Cited by 2 publications
(1 citation statement)
references
References 10 publications
0
1
0
Order By: Relevance
“…The dummy finger between the electrode and the bus bar creates an electrode gap. Although a narrow electrode gap (a narrow gap means that it is close to the light source wavelength of the lithograph or less than it) can help suppress the lateral leakage of SAW [ 2 , 9 , 10 ], it can also cause significant OPE during the lithography process [ 11 , 12 , 13 ]. Hence, for SAW resonators, OPE will cause edge rounding and inward shrinkage of the electrodes and dummy electrodes on both sides of the electrode gaps, which can reduce the effectiveness of transverse SAW leakage suppression.…”
Section: Introductionmentioning
confidence: 99%
“…The dummy finger between the electrode and the bus bar creates an electrode gap. Although a narrow electrode gap (a narrow gap means that it is close to the light source wavelength of the lithograph or less than it) can help suppress the lateral leakage of SAW [ 2 , 9 , 10 ], it can also cause significant OPE during the lithography process [ 11 , 12 , 13 ]. Hence, for SAW resonators, OPE will cause edge rounding and inward shrinkage of the electrodes and dummy electrodes on both sides of the electrode gaps, which can reduce the effectiveness of transverse SAW leakage suppression.…”
Section: Introductionmentioning
confidence: 99%