An x-ray line shift analysis in vacuum-evaporated silver films

Sen, Shrabanee; Halder, S. K.; Gupta, S. P. Sen

doi:10.1088/0022-3727/6/17/304

Cited by 20 publications

(12 citation statements)

References 24 publications

(17 reference statements)

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“…Light and Wagner [5], and Sen et al [12] found that it decreases in Ag films with thickness. Walker [10] observed an increase in Al films with thickness.…”

Section: Summary Of the Results And Proposed Modelsmentioning

confidence: 99%

Structure and Properties of Vacuum-Deposited Cadmium Thin Films

Halder

1979

Zeitschrift Für Naturforschung A

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Thin films of Cd were prepared by vacuum deposition onto glass plates at temperature of 45 °C and pressure of about 10~6 torr. Several good quality films of various thicknesses (15,000 ~ 28,000 Ä) were made. The films were characterized by strong preferred orientation along the 002 planes parallel to the surface of the substrate, which were found to be thickness dependent. In particular, the 002, 100 and 004 peaks were many times stronger than their corresponding diffraction peaks obtained from powder specimens. Both the real and imaginary parts of the Fourier coefficients were considered for line broadening analysis. The particle size (which is also called the average size of the coherently diffracting domains in a direction perpendicular to the diffracting planes), microstrain (which is usually called the mean strain in a given direction) and faulting were determined. A systematic study for all the diffraction peaks indicates an increase of average particle size J) from 546 to 620 A in the above thickness range with no apparent anisotropy for the 100, 002 and 004 directions. The microstrain, however, decreased as much as 50% in this thickness range and showed a considerable amount of anisotropy. The fault parameters a (deformation fault probability) and ß (growth fault probability) decreased rather rapidly for all directions.

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“…Light and Wagner [5], and Sen et al [12] found that it decreases in Ag films with thickness. Walker [10] observed an increase in Al films with thickness.…”

Section: Summary Of the Results And Proposed Modelsmentioning

confidence: 99%

Structure and Properties of Vacuum-Deposited Cadmium Thin Films

Halder

1979

Zeitschrift Für Naturforschung A

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“…Thin films of lead in the thickness range (30±900 nm) were deposited on ultrasonically cleaned glass substrates by vacuum deposition technique following a similar procedure as described elsewhere (Sen et al, 1973).…”

Section: Methodsmentioning

confidence: 99%

An X-ray profile analysis on the growth imperfections and internal strains in vapour-deposited lead films

Sengupta¹,

Bhaumik²,

Chatterjee³

2000

Zeitschrift Für Kristallographie - Crystalline Materials

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Detailed X-Ray line profile studies have been performed on thin films of lead (thickness range $30±900 nm), vapour-deposited onto glass substrates, under high vacuum ($10 ± ±6 Torr). The films reveal unusually high orientation along [111] over the whole thickness range. Both Warren-Averbach and Williamson-Hall analysis have been adopted. W-H plot shows a near-isotropy in strain broadening observed at higher film thickness with predominant microstrain contribution. W-A analysis shows that the crystallite sizes are in the range of 225±2700 A and the rms strains are of the order of 10 ± ±4 . The residual stresses have been found to be small and slightly higher than that due to thermal stress. The combined peak shift, peak asymmetry and peak broadening analyses show the absence of both intrinsic and extrinsic stacking faults while growth faults are found to be present in smaller concentrations. The lattice parameter changes are small and are of the order of 10 ± ±4 . The dislocation density calculated from crystallite sizes and rms strains is of the order of 10 10 cm/cm 3 . Dislocations are the primary cause of strain broadening. The dislocation arrangement changed considerably from a non-random to a near-random distribution with increasing thickness. The microstrain distribution function was however found to be almost Gaussian.

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“…Films were prepared on microscope glass slides by vacuum evaporation method in a 12" vacuum-coating unit from spectroscopically pure silver turnings placed in a tungsten filament at a residual air pressure of N 5 x 10-5 Torr, the rate of deposition being -3 fi s-1. The glass substrates were cleaned in vapour of isopropyl alcohol and then by glow discharge sputtering under vacuum (Sen et al 1973). The deposition was carried out at room temperature (298 K).…”

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“…MDP 4), were further verified by optical interfero-metric measurements (Tolansky 1948(Tolansky , 1960. The x-ray diffraction profiles were chart recorded at room temperature (298 K) in the usual manner (Sen et al 1973).…”

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confidence: 99%

“…As regards the methods of analysis, the same procedures were adopted as described already in our previous work on silver and copper films (Sen et al 1973, 1975a, b, Halder et a1 1976 to evaluate the microstructural parameters, namely, the coherent domain size and microstrain, residual stress and lattice parameter change, density of dislocations and stacking fault concentrations which characterize a film fully.…”

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An X-ray diffraction profile study in silver films vapour-deposited on a rotating substrate with the axial centre at 44 degrees to the vapour direction

Sen

Halder

Gupta

1977

J. Phys. D: Appl. Phys.

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A detailed X-ray diffraction profile analysis on silver films (thickness approximately 32-248 nm), vapour-deposited on a rotating substrate with the axial centre at 44 degrees to the vapour direction, shows the presence of small coherent domain sizes ( approximately 76-305 AA), appreciable microstrains, small lattice parameter change ( approximately 3.5-2.0*10-3 for films <100 nm thick), residual compressive stress, ( sigma approximately 0.05-0.003*10-10 N m-2), appreciable growth or twin stacking fault concentration ( beta approximately 115-25*10-3) and large dislocation density ( approximately 8-1*1011 cm-2). The effects decrease with increasing film thickness and are comparable or slightly reduced in magnitude relative to the case for normal vapour incidence. The films, which were initially random, develop (111) orientation at higher thickness.

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An x-ray line shift analysis in vacuum-evaporated silver films

Cited by 20 publications

References 24 publications

Structure and Properties of Vacuum-Deposited Cadmium Thin Films

Structure and Properties of Vacuum-Deposited Cadmium Thin Films

An X-ray profile analysis on the growth imperfections and internal strains in vapour-deposited lead films

An X-ray diffraction profile study in silver films vapour-deposited on a rotating substrate with the axial centre at 44 degrees to the vapour direction

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