This paper describes a pixel imaging array consisting in 400 m × 400 m photodiodes fabricated in CMOS technology. An array of scintillating CsI:Tl crystals is placed above the photodiodes. These crystals are encapsulated in aluminum walls, forming a light path that guides the visible light produced by the scintillating crystal into the photodiodes. In this way, the X-ray energy is first converted into visible light which is then detected by the photodiode at the end of each light guide. The scintillator is 800 m thick, absorbing almost all 20 keV X-ray photons. Usually, the spatial resolution of the scintillating X-ray detectors is identical to the scintillator thickness. By using the light guides, the scintillator thickness can be increased without decreasing the spatial resolution. The increase of the scintillator thickness is desirable in order to increase the X-rays absorption efficiency. Tests carried out on the system show very promising results near 20 keV.