An Ultrathin, Smooth, and Low‐Loss Al‐Doped Ag Film and Its Application as a Transparent Electrode in Organic Photovoltaics

Zhang, Cheng; Zhao, Dewei; Gu, Deen; Kim, Hyunsoo; Ling, Tao; Wu, Yi; Guo, L. Jay

doi:10.1002/adma.201306091

Cited by 231 publications

(198 citation statements)

References 36 publications

(4 reference statements)

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“…Several approaches to use an ultrathin (<10 nm) Ag electrode have been reported. [38][39][40][41][42][43][44][45][46][47][48][49] As the OT of the electrode increases, its emission spectrum broadens, in agreement with theoretical expectations for a weak microcavity. 56 Using a weak microcavity also increases the angular color stability and the device efficiency.…”

Section: Abssupporting

confidence: 87%

“…76 This dewetting tendency of pure Ag becomes more obvious at elevated temperatures. 57,77 Zhang et al 48 and Gu et al 49 used Al doping to fabricating ultrathin (3 nm) Ag-based thin films with high thermal stability on SiO 2 ∕Si (100) substrates. Al doping yielded smaller and denser nuclei [ Fig.…”

Section: Doping Effectmentioning

confidence: 99%

“…75 A 7 nm Al-doped Ag-based device with a resonance cavity in the active layer between the reflective anode and the semitransparent ultrathin Al-doped Ag cathode has a spectrum peak that is close to the absorption edge of a photoactive absorber. 48 …”

Section: Organic Light-emitting Diode Lighting and Organic Solar Cellmentioning

confidence: 99%

“…Ultrathin Ag electrodes are promising for this function because the OT and R s of these electrodes are comparable to or better than those of ITO electrodes. [38][39][40][41][42][43][44][45][46][47][48][49] In addition, their mechanical properties are appropriate for use in flexible devices. 40 This review highlights recent progress in the fabrication of nanoscale thin Ag electrodes.…”

Section: Introductionmentioning

confidence: 99%

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Transparent electrode of nanoscale metal film for optoelectronic devices

Lee

2015

J. Photon. Energy

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Abstract. This paper reviews the principles, impediments, and recent progress in the development of ultrathin flexible Ag electrodes for use in flexible optoelectronic devices. Thin Ag-based electrodes are promising candidates for next-generation flexible transparent electrodes. Thin Ag-based electrodes that have a microcavity structure show the best device performance, but have relatively low optical transmittance (OT) due to reflection and absorption of photons by the thin Ag; this trait causes problems such as spectral narrowing and change of emission color with viewing angle in white organic light-emitting diodes. Thinning the Ag electrode to < − 10 nm thickness (ultrathin Ag) is an approach to overcome these problems. This ultrathin Ag electrode has a high OT, while providing comparable sheet resistance similar to indium tin oxide. As the OT of the electrode increases, the cavity is weakened, so the spectral width of the emission and the angular color stability are increased.

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Section: Abssupporting

confidence: 87%

Section: Doping Effectmentioning

confidence: 99%

Section: Organic Light-emitting Diode Lighting and Organic Solar Cellmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Transparent electrode of nanoscale metal film for optoelectronic devices

Lee

2015

J. Photon. Energy

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“…Because thin metallic and dielectric films are required to achieve efficient coupling between the SPs at each metal and dielectric interface, similar questions regarding the impacts of the roughness of the mask or the thin film on the pattern quality are raised. Indeed, it has been shown in several studies that film roughness distorts the normal propagation and coupling of waves especially in nanoscale films [14,[19][20][21][22][23], leading to non-uniform PR patterns with poor profiles [24]. All these concerns put critical restrictions on the plasmonic-based lithography for practical applications.…”

Section: Introductionmentioning

confidence: 99%

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

et al. 2017

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Abstract:The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity.

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