2016
DOI: 10.1109/ted.2016.2568279
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An Ultrathin Organic Insulator for Metal–Insulator–Metal Diodes

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Cited by 8 publications
(18 citation statements)
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“…2), which is also consistent with our previous results, 6 and is considerably smaller than the values reported in the literature (typically in the MΩ regime). 23 The relatively small resistance associated with the diodes is attributed to the very thin OTS layer (~2 nm), as the resistance of MIM structures is significantly influenced by the thickness of the dielectric layer.…”
Section: Main Textsupporting
confidence: 93%
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“…2), which is also consistent with our previous results, 6 and is considerably smaller than the values reported in the literature (typically in the MΩ regime). 23 The relatively small resistance associated with the diodes is attributed to the very thin OTS layer (~2 nm), as the resistance of MIM structures is significantly influenced by the thickness of the dielectric layer.…”
Section: Main Textsupporting
confidence: 93%
“…To overcome this problem, we have previously reported the development of a MIM diode in which organometallic molecules self-assemble in an insulating monolayer. 6 The diode used an octadecyltrichlorosilane (OTS) self-assembled monolayer (SAM), which consists of carbon chains strongly packed together with an overall thickness of approximately 2 nm. Due to the nature of self-assembly, a second layer cannot grow on top of the first one, resulting in a uniform thickness over large areas determined by the SAM chemistry.…”
Section: Main Textmentioning
confidence: 99%
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