“…Several techniques are applied to prepare SiNWs: lithographic methods, laser ablation, various CVD techniques, solution phase synthesis, chemical etching, molecular beam epitaxy, oxide assisted growth method [1][2][3][4][5][6]. Many of them incorporate VLS/VSS (Vapor-Liquid-Solid, Vapor-Solid-Solid) approaches in which nanoscale metal particles serve as initialization/growth agents.…”