An optimal substrate design for SERS: dual-scale diamond-shaped gold nano-structures fabricated via interference lithography

Ahn, Hyo-Jin; Thiyagarajan, Pradheep; Jia, Lin; Kim, Sun‐I; Yoon, Jong–Hyun; Thomas, Edwin L.; Jang, Ji‐Hyun

doi:10.1039/c3nr33498h

Cited by 55 publications

(40 citation statements)

References 45 publications

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“…LIL is a powerful tool for uniform large‐scale micro/nano‐structure fabrication. To achieve smaller features, pre/post‐processing is applied …”

Section: Application Case Studiesmentioning

confidence: 99%

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Hong

2020

Laser & Photonics Reviews

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Photolithography is one of the most commonly used techniques in semiconductor manufacturing, which is the foundation for all the modern electronic device fabrication. However, deep and extreme ultraviolet lithographic systems as well as the corresponding photomasks are both relatively expensive. The fabrication methods are based on the low‐speed high‐cost electron‐beam lithography or focused‐ion‐beam etching. Therefore, a maskless high‐speed method is highly recommended for the micro/nano‐structure fabrication. Among all these maskless methods, direct laser writing (DLW) is an important and widely adopted micro‐processing technique. Based on the nonlinear exposure, the feature size can achieve down to tens of nanometers. However, the speed of DLW is a technical bottleneck. To overcome this issue, parallel DLW methods are developed, including the self‐assembly microspheres laser patterning, laser interference lithography, and multifocal array DLW. Herein, the principles, advantages, challenges, and applications of these parallel processing technologies are summarized. Nanoscale resolution for large area arbitrary periodic pattern fabrication is achieved. Meanwhile, these technologies have the unique ability to build 3D structures instead of conventional 2D patterns, which is the direction of future micro/nano‐fabrication. These techniques are widely applied to surface processing and functional device fabrication in the field of sensing, solar cells, and metamaterials.

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“…LIL is a powerful tool for uniform large‐scale micro/nano‐structure fabrication. To achieve smaller features, pre/post‐processing is applied …”

Section: Application Case Studiesmentioning

confidence: 99%

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Hong

2020

Laser & Photonics Reviews

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“…Typically, two different processes are categorized: top-down and bottom-up fabrication techniques. The former includes focused ion beam (FIB) milling [59][60][61][62], electron-beam lithography (EBL) [63][64][65][66][67], nanoimprint [68][69][70][71], and interference lithography [72][73][74][75]. Various plasmonic designs have been demonstrated to enhance the sensing effect.…”

Section: Plasmonic Nanostructures For Enhanced Sensing Applicationsmentioning

confidence: 99%

Plasmon‐Enhanced Sensing: Current Status and Prospects

Leong

Jiang

et al. 2015

Journal of Nanomaterials

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By combining different plasmonic nanostructures with conventional sensing configurations, chemical/biosensors with significantly enhanced device performance can be achieved. The fast development of plasmon-assisted devices benefits from the advance of nanofabrication technology. In this review, we first briefly show the experimental configurations for testing plasmon enhanced sensing signals and then summarize the classic nanogeometries which are extensively used in sensing applications. By design, dramatic increment of optical signals can be obtained and further applied to gas, refractive index and liquid sensing.

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“…Therefore, considerable research efforts have been made to push SERS as a practical analytical tool. SERS performance is mainly depends on the substrate, thus lots of efforts have been devoted to fabricate high-sensitive SERS substrates, including vacuum evaporation, 11 X-ray interference lithography, 12 laser interference lithography, 13 and ion-beam sputtering, 14 etc. These SERS substrates possess large SERS enhancement ability and reproducibility.…”

Section: Introductionmentioning

confidence: 99%

Wetting properties and SERS applications of ZnO/Ag nanowire arrays patterned by a screen printing method

et al. 2016

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Three-dimension (3D) ZnO/Ag nanowire arrays (NWA) SERS substrates are fabricated by screen printing technique. The preparation of patterned ZnO NWA involves a two-step growth process. The ZnO nanoparticles (NPs)-based ink is prepared and printed as seed layers, which are used as templates to fabricate patterned ZnO NWA via a hydrothermal method. During the screen printing process, the patterns of ZnO NWA are controlled by printing plates. The as-obtained NWA with 2 uniform morphology was fabricated at 90 °C, which exhibit hydrophilic and lipophilic properties.Subsequently, the sensitive 3D SERS substrates are fabricated through deposition of Ag NPs onto the surface of patterned ZnO NWA by magnetron sputtering. The detection limit of Malachite green (MG) can achieve 10 -12 M with an enhancement factor of about 2.5×10 10 . Combined with the sensitivity and uniformity, the ZnO/Ag NWA is applied for the quick detection of low concentrations of molecules related to food safety, such as amoxicillin.

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An optimal substrate design for SERS: dual-scale diamond-shaped gold nano-structures fabricated via interference lithography

Cited by 55 publications

References 45 publications

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Parallel Laser Micro/Nano‐Processing for Functional Device Fabrication

Plasmon‐Enhanced Sensing: Current Status and Prospects

Wetting properties and SERS applications of ZnO/Ag nanowire arrays patterned by a screen printing method

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