2006
DOI: 10.1016/j.compchemeng.2006.03.002
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An object-oriented framework for modular chemical process simulation with semiconductor processing applications

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Cited by 15 publications
(7 citation statements)
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“…However, each component and element of the network is well annotated and described by appropriate constitutive equations. Each element of the network can be represented as an appropriate object in modular form (Chen, Adomaitis 2006), whereas the equation-oriented formalism enables the exact representation of each module by a set of detailed mathematical equations (Pattison, Baldea 2014). Assembling of individual models can easily be automated in a “drag-and-drop” manner and complex models can therefore be generated and analyzed in great detail.…”
Section: Qsp: the Frameworkmentioning
confidence: 99%
“…However, each component and element of the network is well annotated and described by appropriate constitutive equations. Each element of the network can be represented as an appropriate object in modular form (Chen, Adomaitis 2006), whereas the equation-oriented formalism enables the exact representation of each module by a set of detailed mathematical equations (Pattison, Baldea 2014). Assembling of individual models can easily be automated in a “drag-and-drop” manner and complex models can therefore be generated and analyzed in great detail.…”
Section: Qsp: the Frameworkmentioning
confidence: 99%
“…Computing the AB limit‐cycle over the time period 0 ≤ t ≤ τ A + τ B requires one additional important criterion; that the state of the surface return to its initial condition at the end of the cycle t = τ A + τ B . The combination of initial conditions and the Equations 2 and 3 constitute a set of ordinary differential and linear algebraic equations; we reduce this set of equations to a larger set of (non)linear algebraic equations using a collocation procedure, solving the algebraic equations using the Newton‐Raphson method 35…”
Section: Limit‐cycle Solutionsmentioning
confidence: 99%
“…To compute gpc , we recall that the number of Al and O atoms deposited per unit area over one deposition cycle are N Al and N O atoms per nm 2 , respectively, and can compute these values by integrating the reaction rates over each half‐cycle using the quadrature weights of the collocation procedure,35 as in Equation 20. …”
Section: Limit‐cycle Solutionsmentioning
confidence: 99%
“…MATLAB has been successfully applied to solve PSE problem, especially in the modelling and simulation parts, e.g. multivariate statistical process control for process fault detection and diagnosis,73–75 develop an object‐oriented framework for modular chemical process simulation with semiconductor processing applications 76…”
Section: Available Software Toolsmentioning
confidence: 99%