2008
DOI: 10.1016/j.nimb.2007.12.069
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An ion track based approach to nano- and micro-electronics

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Cited by 47 publications
(16 citation statements)
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“…Another important direction of track electronics is based on electrolytes in etched tracks (Electronics with Electrolytes in Etched Tracks, E 3 T) [17][18][19][20][21][22]. It has been demonstrated that fundamental electronic elements such as resistors, capacitors, diodes, sensors, pulse generators and elements with NDR can be produced in this way.…”
Section: Ion Tracks In Non-metallic Materialsmentioning
confidence: 99%
“…Another important direction of track electronics is based on electrolytes in etched tracks (Electronics with Electrolytes in Etched Tracks, E 3 T) [17][18][19][20][21][22]. It has been demonstrated that fundamental electronic elements such as resistors, capacitors, diodes, sensors, pulse generators and elements with NDR can be produced in this way.…”
Section: Ion Tracks In Non-metallic Materialsmentioning
confidence: 99%
“…Ion track technologies are currently a powerful approach for producing new macro-and nanomaterials. From the very beginning, they were based on the idea of using ion tracks [1][2][3][4].…”
Section: Introductionmentioning
confidence: 99%
“…The irradiation conditions for obtaining etched tracks in amorphous SiO 2 were investigated in refs. . It has been established that SHI irradiation followed by etching in dilute hydrofluoric acid (HF) leads to the formation of nanoporous SiO 2 layer with a controlled nanopore density, shape and dimensions from 10 nm to several micrometers.…”
Section: Introductionmentioning
confidence: 99%