1980
DOI: 10.1016/0038-1098(80)90628-6
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An investigation of the valley splitting in n-channel silicon 〈100〉 inversion layers

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1981
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Cited by 36 publications
(22 citation statements)
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“…The gap value, its linear dependence on substrate bias [5], and its insensitivity to parallel magnetic field [8] are consistent with single-particle theoretical considerations for an asymmetric potential well that contains a 2D electron gas [9,10].…”
supporting
confidence: 73%
See 1 more Smart Citation
“…The gap value, its linear dependence on substrate bias [5], and its insensitivity to parallel magnetic field [8] are consistent with single-particle theoretical considerations for an asymmetric potential well that contains a 2D electron gas [9,10].…”
supporting
confidence: 73%
“…However, this is the strongly interacting limit in which existing theories are not valid and, therefore, they cannot be directly applied to silicon MOSFETs. The origin of the excitations for the valley splitting is unknown so far.Experimental investigations of the valley splitting were performed largely [3] at high filling factor ν ≥ 9 based on analysis of the beating pattern of Shubnikov-de Haas oscillations in tilted magnetic fields [4,5,6,7]. The gap value, its linear dependence on substrate bias [5], and its insensitivity to parallel magnetic field [8] are consistent with single-particle theoretical considerations for an asymmetric potential well that contains a 2D electron gas [9,10].…”
mentioning
confidence: 70%
“…lifting of the degeneracy. This effect has been observed experimentally in Shubnikov-de Haas oscillation measurements in high magnetic fields 4,5,6,7,8,9,10,11 with energy splitting up to a few meV. Boykin et al presented a tight-binding model of the ground state splitting in a biased square quantum well with both hard-wall and cyclic boundary conditions 12,13,14 .…”
mentioning
confidence: 98%
“…Experimental research on the valley splitting, on the other hand, was conducted mainly on the Si metaloxide-semiconductor field-effect transistors (MOSFETs), in which the disorder effect is strong and direct measurement of the valley splitting proves to be difficult [5,6]. More than a decade ago, the introduction of the graded buffer scheme significantly improved the sample quality of the Si/SiGe heterostructures [7].…”
mentioning
confidence: 99%